Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 3/20 | 0.33 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.33 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.33 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.33 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.33 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.33 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.32 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.32 |
| ▸ | STAT6 | P42226 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL498011 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3334426 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Phosphine SCHEMBL25171299 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3418491 | 0.70 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL5707247 | 0.70 | MAPT (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL7741376 | 0.70 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL28208318 | 0.70 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL678264 | 0.70 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL292702 | 0.70 | GRIN2D (0.43) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL27564055 | 0.70 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-116300314-A | Photosensitive resin composition | 旭化成株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-115917432-A | Photosensitive composition, photosensitive dry film, method for producing substrate with mold for plating, and method for producing plated article | 东京应化工业株式会社 | 2023-04-04 | — | — | CN | disclosed |
| US-20230102353-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-114967342-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114967343-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114902134-A | Chemically amplified photosensitive composition, photosensitive dry film and method for producing same, method for producing resist film, and acid diffusion inhibitor | 东京应化工业株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114868081-A | Photosensitive resin composition, dry film and method for producing same, resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-05 | — | — | CN | disclosed |
| CN-114690560-A | Photosensitive resin composition, dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| US-11142629-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-12 | — | — | US | disclosed |
| WO-2021131538-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING PLATED MODELED OBJECT | 東京応化工業株式会社 | 2021-07-01 | — | — | WO | disclosed |
| US-20200139433-A1 | METHOD FOR PRODUCING SURFACE-MODIFIED METAL OXIDE FINE PARTICLE, METHOD FOR PRODUCING IMPROVED METAL OXIDE FINE PARTICLES, SURFACE-MODIFIED METAL OXIDE FINE PARTICLES, AND METAL OXIDE FINE PARTICLE DISPERSION LIQUID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-07 | — | — | US | disclosed |
| WO-2020032133-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2020-02-13 | — | — | WO | disclosed |
| US-20190300674-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-10-03 | — | — | US | disclosed |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-5021184-A | Adamantane derivatives, compositions of matter containing same, processes for preparing said adamantane derivatives and said compositions, and organoleptic and deodorancy uses of said adamantane derivatives and said compositions | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 1991-06-04 | — | — | US | disclosed |
| EP-0377274-A2 | Adamantane derivatives, process for their preparation, compositions containing them and their use as organoleptics and deodorants | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 1990-07-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | GRIN2D 2302/4885GRIN3B 2807/4885GRIN1 1399/4885 |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | SLC9A2, SLC9A1, NHERF1 | GRIN2D 2302/4885GRIN3B 2807/4885GRIN1 1399/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.