SCHEMBL986627

SCHEMBL986627

O=C(OC(Cl)C(Cl)Cl)C(Cl)(Cl)Cl

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
TP53 P04637 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27875403 0.78 ALDH1A1 (0.35) ALDH1A1TP53TSHR
SCHEMBL27671488 0.74 ALDH1A1 (0.32) ALDH1A1TP53TSHR
SCHEMBL2760916 0.71 LMNA (0.32)
SCHEMBL10412379 0.70 ALDH1A1 (0.33) ALDH1A1TP53TSHR
SCHEMBL1707076 0.70 TSHR (0.46) ALDH1A1TP53TSHR
SCHEMBL3024 0.69
SCHEMBL583308 0.69
SCHEMBL6382664 0.69 LMNA (0.31)
SCHEMBL10938404 0.69
SCHEMBL1865097 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104892655-B Method for preparing alkyl borate compound based on iron catalysis 大连理工大学 2017-06-27 CN disclosed
US-20160349088-A1 MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES PATEL GORDHANBHAI (US) 2016-12-01 US disclosed
CN-1950750-B Pattern forming material, pattern forming apparatus, and pattern forming method ASAHI KASEI E MATERIALS CORP 2012-10-24 CN disclosed
CN-101052918-B Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus, and pattern forming method ASAHI KASEI E MATERIALS CORP 2012-09-26 CN disclosed
EP-2475612-A1 MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES JP LABORATORIES, INC. (US) 2012-07-18 EP disclosed
CN-101103310-B Material for pattern formation, apparatus for pattern formation, and method for pattern formation FUJI FILM CORP 2012-03-14 CN disclosed
CN-101135852-B Pattern forming material and method FUJI FILM CORP. (JP) 2012-02-08 CN disclosed
CN-101124516-B Pattern forming material, pattern forming apparatus, and pattern forming method FUJI PHOTO FILM CO LTD 2012-01-18 CN disclosed
WO-2011031959-A1 MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES JP LABORATORIES, INC. (US) 2011-03-17 WO disclosed
US-20110003279-A1 Monitoring devices and processes based on transformation, destruction and conversion of nanostructures PATEL GORDHANBHAI NATHALAL 2011-01-06 US disclosed
US-5145760-A POSITIVE-WORKING PHOTOSENSITIVE ELECTROSTATIC MASTER WITH IMPROVED INVIRONMENTAL LATITUDE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-08 US disclosed
US-5030548-A Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-07-09 US disclosed
CN-1048606-A Has the sensitization static negative that contains leuco dye that prints off image DU PONT (US) 1991-01-16 CN disclosed
EP-0405543-A2 Photosensitive leuco dye containing electrostatic master with printout image E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-01-02 EP disclosed
US-4945020-A MIXTURE OF POLYMIERC BINDER, PHOTOOXIDANT, LEUCO DYE, HALOGENATED HYDROCARBON AND PLASTICIZER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1990-07-31 US disclosed
US-4923781-A STORAGE STABILITY, CONTRAST, HIGH DENSITY, PHOTOSENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1990-05-08 US disclosed
US-4343885-A PHOTORESISTS DYNACHEM CORPORATION (US) 1982-08-10 US disclosed
EP-0005380-B1 PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER Dynachem Corporation (US) 1982-01-06 EP disclosed
EP-0005380-A2 Phototropic photosensitive compositions containing a fluoran colorformer Dynachem Corporation (US) 1979-11-14 EP disclosed
US-4065315-A Phototropic dye system and photosensitive compositions containing the same DYNACHEM CORPORATION (US) 1977-12-27 US disclosed