SCHEMBL9883232

SCHEMBL9883232

CCC(=O)OC1(C)C2CC3C(=O)OC1C3C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.31
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9881046 0.90 NLRP3 (0.34) CYP17A1CYP19A1
SCHEMBL9883266 0.90
SCHEMBL9881061 0.85 NLRP3 (0.31)
SCHEMBL10061184 0.84
SCHEMBL786003 0.82 HMGCR (0.31)
SCHEMBL12575181 0.81
SCHEMBL439878 0.81 CYP17A1 (0.33) CYP17A1CYP19A1
SCHEMBL685984 0.80
SCHEMBL685985 0.80 ALDH1A1 (0.33)
SCHEMBL12783169 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-20130209938-A1 Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same CENTRAL GLASS COMPANY, LTD. (JP) 2013-08-15 US disclosed
US-20120226070-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2012-09-06 US disclosed
US-8187787-B2 Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same CENTRAL GLASS COMPANY, LIMITED (JP) 2012-05-29 US disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
US-20110098500-A1 Polymerizable Fluorine-Containing Compound CENTRAL GLASS COMPANY, LIMITED (JP) 2011-04-28 US disclosed
US-7906269-B2 Positive-type resist composition CENTRAL GLASS COMPANY, LIMITED (JP) 2011-03-15 US disclosed
US-20090061353-A1 Positive-Type Resist Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2009-03-05 US disclosed
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2009-01-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110098500-A1 Polymerizable Fluorine-Containing Compound FRG1, AFF1, H1-2 CYP17A1 3881/4885CYP19A1 2071/4885
US-20120226070-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same RTF1, FGFR2, FGFR1 CYP17A1 3299/4885CYP19A1 2385/4885
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same FGFR2, RTF1, ADGRF1 CYP17A1 2942/4885CYP19A1 2299/4885
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same FRG1, AFF2, AFF1 CYP17A1 3035/4885CYP19A1 2724/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.