SCHEMBL989034

SCHEMBL989034

Cc1cccc(C)c1P(=O)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.46
POLB P06746 1/20 0.46
KMT2A Q03164 5/20 0.41
EPHX1 P07099 1/20 0.40
LMNA P02545 1/20 0.39
ALDH1A1 P00352 2/20 0.39
KCNK3 O14649 1/20 0.39
KCNK9 Q9NPC2 1/20 0.39
RAB9A P51151 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
NPC1 O15118 2/20 0.39
MAPT P10636 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
ATM Q13315 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MEN1 O00255 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL345962 0.91 HPGD (0.46) HPGDPOLBEPHX1ALDH1A1KCNK3
SCHEMBL2771670 0.88 NR1H4 (0.40) HPGDPOLBKMT2AEPHX1LMNA
SCHEMBL37050 0.87 LMNA (0.40) HPGDPOLBKMT2ALMNARAB9A
SCHEMBL988213 0.87 POLB (0.40) HPGDPOLBKMT2AEPHX1LMNA
SCHEMBL2771466 0.83 KMT2A (0.44) HPGDPOLBKMT2AEPHX1LMNA
SCHEMBL8514991 0.83 HPGD (0.46) HPGDPOLBKMT2AEPHX1LMNA
SCHEMBL58814 0.81 ALDH1A1 (0.52) POLBKMT2AALDH1A1RAB9ANPC1
SCHEMBL21880196 0.79 SMN1; SMN2 (0.44) HPGDPOLBKMT2ALMNAALDH1A1
SCHEMBL28050614 0.79 NPC1 (0.53) HPGDPOLBKMT2ALMNAALDH1A1
Trimethylammonium SCHEMBL28815416 0.78 RAB9A (0.46) HPGDKMT2ALMNAALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4279553-A2 INK COMPOSITION, PROCESS FOR PRODUCING SAME, AND INK-JET INK SET AND INK-JET PRINTING SYSTEM BOTH INCLUDING SAID INK COMPOSITION Maxell, Ltd. (JP) 2023-11-22 EP disclosed
EP-3351601-B1 INK COMPOSITION, PROCESS FOR PRODUCING SAME, AND INK-JET INK SET AND INK-JET PRINTING SYSTEM BOTH INCLUDING SAID INK COMPOSITION MAXELL LTD (JP) 2023-09-06 EP disclosed
US-10907063-B2 Ink composition, process for producing same, and ink-jet ink set and ink-jet printing system both including said ink composition MAXELL HOLDINGS, LTD. (JP) 2021-02-02 US disclosed
US-10822509-B2 Ink composition, process for producing same, and ink-jet ink set and ink-jet printing system both including said ink composition MAXELL HOLDINGS, LTD. (JP) 2020-11-03 US disclosed
US-20190315986-A1 INK COMPOSITION, PROCESS FOR PRODUCING SAME, AND INK-JET INK SET AND INK-JET PRINTING SYSTEM BOTH INCLUDING SAID INK COMPOSITION MAXELL HOLDINGS, LTD. (JP) 2019-10-17 US disclosed
WO-2019142657-A1 PRODUCTION METHOD FOR ARTICLE WITH TRANSFERRED PRINTED IMAGE AND TECHNOLOGY RELATED THERETO 株式会社松井色素化学工業所 2019-07-25 WO disclosed
EP-3351601-A1 INK COMPOSITION, PROCESS FOR PRODUCING SAME, AND INK-JET INK SET AND INK-JET PRINTING SYSTEM BOTH INCLUDING SAID INK COMPOSITION Maxell Holdings, Ltd. (JP) 2018-07-25 EP disclosed
US-20180066150-A1 INK COMPOSITION, PROCESS FOR PRODUCING SAME, AND INK-JET INK SET AND INK-JET PRINTING SYSTEM BOTH INCLUDING SAID INK COMPOSITION HITACHI MAXELL, LTD. (JP) 2018-03-08 US disclosed
US-20170327737-A1 CURABLE COMPOSITION CONTAINING SEMICONDUCTOR NANOPARTICLES, CURED PRODUCT, OPTICAL MATERIAL AND ELECTRONIC MATERIAL SHOWA DENKO K.K. (JP) 2017-11-16 US disclosed
EP-3228640-A1 CURABLE COMPOSITION CONTAINING SEMICONDUCTOR NANOPARTICLES, CURED PRODUCT, OPTICAL MATERIAL AND ELECTRONIC MATERIAL Showa Denko K.K. (JP) 2017-10-11 EP disclosed
CN-101052681-A Radiation-curable composition, cured product thereof, and laminate thereof MITSUBISHI CHEM CORP (JP) 2007-10-10 CN disclosed
WO-2006104281-A1 INK SET FOR INK JET RECORDING, INK FOR INK JET RECORDING, AND INK JET IMAGE RECORDING METHOD FUJIFILM CORPORATION (JP) 2006-10-05 WO disclosed
WO-2005093467-A2 PHOTOCHROMIC OPTICAL ARTICLE TRANSITIONS OPTICAL, INC. (US) 2005-10-06 WO disclosed
US-20040207809-A1 Photochromic optical article TRANSITIONS OPTICAL LIMITED (IE) 2004-10-21 US disclosed
EP-1461644-A1 PHOTOCHROMIC OPTICAL ARTICLE TRANSITIONS OPTICAL, INC. (US) 2004-09-29 EP disclosed
US-20030165686-A1 Photochromic optical article TRANSITIONS OPTICAL LIMITED (IE) 2003-09-04 US disclosed
WO-2003058300-A1 PHOTOCHROMIC OPTICAL ARTICLE TRANSITIONS OPTICAL, INC. (US) 2003-07-17 WO disclosed
US-6372340-B1 GLOSS RETENTION GEN MAINTENANCE TECHNOLOY INC. (JP) 2002-04-16 US disclosed
US-6040049-A COMPOSITE FILMS, SHEETS, TRANSMITTING LIGHT, WATER SOLUBILITY RESIN COATING FILMS, HARDENING BY IRRADIATION GEN MAINTENANCE TECHNOLOGY INC. (JP) 2000-03-21 US disclosed
EP-0837109-A2 Composite film and method of manufacturing surface coating material Gen Gen Kagaku Kogyo Co. Ltd. (JP) 1998-04-22 EP disclosed