Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | CASP6 | P55212 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908400 | 0.75 | ALDH1A1 (0.43) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL9908387 | 0.72 | LMNA (0.33) | POLBALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL7746827 | 0.70 | POLB (0.56) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL7746830 | 0.70 | POLB (0.56) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL12256175 | 0.70 | POLB (0.49) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL7747755 | 0.70 | POLB (0.56) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL18641576 | 0.68 | POLB (0.49) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL17717479 | 0.68 | POLB (0.54) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL12705164 | 0.68 | POLB (0.54) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL9908405 | 0.68 | HPGD (0.34) | POLBALDH1A1HPGDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |