Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | POLB | P06746 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14625814 | 0.80 | — | — | |
| SCHEMBL9908411 | 0.77 | ALDH1A1 (0.32) | HPGDLMNAKMT2AALDH1A1MEN1 | |
| SCHEMBL9908387 | 0.76 | LMNA (0.33) | HPGDLMNASMN1; SMN2KMT2AALDH1A1 | |
| SCHEMBL7126089 | 0.75 | ALDH1A1 (0.32) | ALDH1A1POLB | |
| SCHEMBL13992888 | 0.74 | — | — | |
| SCHEMBL9908412 | 0.72 | NPC1 (0.36) | HPGDKMT2AALDH1A1POLBMEN1 | |
| SCHEMBL9908422 | 0.70 | HPGD (0.46) | HPGDLMNASMN1; SMN2KMT2AALDH1A1 | |
| SCHEMBL9908398 | 0.68 | POLB (0.40) | HPGDSMN1; SMN2ALDH1A1POLB | |
| SCHEMBL2994979 | 0.67 | ALDH1A1 (0.44) | HPGDLMNASMN1; SMN2KMT2AALDH1A1 | |
| SCHEMBL9908399 | 0.65 | MEN1 (0.32) | HPGDKMT2AALDH1A1MEN1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7163778-B2 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |