SCHEMBL9909395

SCHEMBL9909395

C=C(C)C(=O)OC1CCCC(=O)OC1CCC

nearest known ligand 0.51

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 6/20 0.40
KAT2A Q92830 2/20 0.33
GPX4 P36969 1/20 0.32
CYP1A2 P05177 2/20 0.32
ATM Q13315 3/20 0.32
KDM4E B2RXH2 1/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
PKM P14618 1/20 0.32
HTT P42858 1/20 0.32
RECQL P46063 1/20 0.32
RAB9A P51151 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11982284 0.88 PRKCA (0.41) PRKCAKAT2ACYP1A2
SCHEMBL10081772 0.77 ALDH1A1 (0.36)
SCHEMBL1897765 0.75 ALDH1A1 (0.33) GPX4ATMKDM4ENPC1POLB
SCHEMBL10070041 0.75 PRKCA (0.35) PRKCAKDM4EPOLBRECQLRAB9A
SCHEMBL10329978 0.74 ALDH1A1 (0.31)
SCHEMBL13706387 0.74 PRKCA (0.51) PRKCA
SCHEMBL18467661 0.72 PRKCA (0.35) PRKCA
SCHEMBL23493969 0.72 CA1 (0.38)
SCHEMBL10195945 0.70 PRKCA (0.40) PRKCA
SCHEMBL12837581 0.70 CYP2D6 (0.42) ATMCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-7491483-B2 Polymers, positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same FRG1, AFF2, AFF1 PRKCA 3669/4885KAT2A 548/4885GPX4 2506/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.