Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACACB | O00763 | 1/20 | 0.50 |
| ▸ | ACACA | Q13085 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.49 |
| ▸ | HPGD | P15428 | 4/20 | 0.49 |
| ▸ | MAPT | P10636 | 4/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.49 |
| ▸ | GAA | P10253 | 2/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 9/20 | 0.49 |
| ▸ | NPC1 | O15118 | 8/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.49 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.48 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 2/20 | 0.44 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL990934 | 0.94 | RAB9A (0.56) | ACACBACACAALDH1A1KDM4EHPGD | |
| SCHEMBL13578477 | 0.92 | TUBB4A (0.48) | ACACBACACAALDH1A1KDM4EHPGD | |
| SCHEMBL15382000 | 0.88 | RARB (0.52) | ALDH1A1KDM4EHPGDMAPTCYP1A2 | |
| SCHEMBL991686 | 0.87 | TP53 (0.47) | ALDH1A1KDM4EHPGDMAPTCYP1A2 | |
| SCHEMBL8956327 | 0.86 | NPC1 (0.49) | ALDH1A1KDM4EHPGDMAPTCYP1A2 | |
| SCHEMBL8605824 | 0.86 | NR1I2 (0.44) | ACACBACACAALDH1A1KDM4EHPGD | |
| SCHEMBL13578485 | 0.84 | XDH (0.62) | ALDH1A1KDM4EMAPTRAB9ANPC1 | |
| SCHEMBL28131880 | 0.83 | ACACB (0.61) | ACACBACACAALDH1A1KDM4EHPGD | |
| SCHEMBL22714158 | 0.81 | FYN (0.38) | ALDH1A1KDM4EHPGDMAPTCYP1A2 | |
| SCHEMBL13578484 | 0.80 | TLR4 (0.41) | ALDH1A1KDM4EHPGDMAPTCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1687678-B1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, METHOD OF FORMING CURED ARTICLE AND USE OF THE METHOD FOR PRODUCING FUNCTIONAL DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2013-07-31 | — | — | EP | disclosed |
| US-7871756-B2 | Chemically amplified positive photosensitive thermosetting resin composition, method of forming cured article, and method of producing functional device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7816072-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-7629051-B2 | Optical film containing fluorinated photopolymerization initiator, antireflective film, polarizing plate and image display unit including same | FUJIFILM CORPORATION (JP) | 2009-12-08 | — | — | US | disclosed |
| US-20090081590-A1 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090068594-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-7358028-B2 | Chemically amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20080044764-A1 | Chemically Amplified Positive Photosensitive Thermosetting Resin Composition, Method Of Forming Cured Article, And Method Of Producing Functional Device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-21 | — | — | US | disclosed |
| US-7329478-B2 | Chemical amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-12 | — | — | US | disclosed |
| US-20070117045-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-05-24 | — | — | US | disclosed |
| US-7105265-B2 | Method for removing resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060003260-A1 | Chemical amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-05 | — | — | US | disclosed |
| US-20050244740-A1 | Chemically amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050130055-A1 | Method and removing resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-5180653-A | Triazine Compound, Cresol Novolak, Alkoxymethylated Melamine | TOKYO OHKA KOGYO CO., LTD. (JP) | 1993-01-19 | — | — | US | disclosed |
| US-5057397-A | Fine patterning of semiconductor | TOKYO OHKA KOGYO CO., LTD. (JP) | 1991-10-15 | — | — | US | disclosed |