SCHEMBL990934

SCHEMBL990934

CCCCOc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 6/20 0.56
NPC1 O15118 5/20 0.56
SMN1; SMN2 Q16637 4/20 0.56
HSD17B10 Q99714 1/20 0.56
KDM4E B2RXH2 3/20 0.53
CYP2D6 P10635 11/20 0.50
CYP19A1 P11511 9/20 0.50
CYP2C9 P11712 9/20 0.50
CYP2C19 P33261 9/20 0.50
CYP3A4 P08684 6/20 0.50
MAPT P10636 2/20 0.48
ALDH1A1 P00352 2/20 0.48
HPGD P15428 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
CYP1A2 P05177 6/20 0.48
LMNA P02545 1/20 0.46
POLB P06746 1/20 0.46
ACACB O00763 1/20 0.43
ACACA Q13085 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15382000 0.94 RARB (0.52) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL991056 0.94 ACACB (0.50) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL8956327 0.92 NPC1 (0.49) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL991686 0.87 TP53 (0.47) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL13578477 0.86 TUBB4A (0.48) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL8605824 0.86 NR1I2 (0.44) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL14257518 0.83 RAB9A (0.66) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL10156182 0.82 LMNA (0.57) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL13873049 0.81 CYP2D6 (0.38) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E
SCHEMBL13873053 0.81 CYP2D6 (0.38) RAB9ANPC1SMN1; SMN2HSD17B10KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 364 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026100726-A1 DECORATIVE FILM, ELECTRONIC MEMBER, AND TOUCH PAD JSR株式会社 2026-05-15 WO disclosed
US-20260085194-A1 OPTICAL PRODUCT TOKYO OHKA KOGYO CO LTD (JP) 2026-03-26 US disclosed
US-12523930-B2 Nanoimprint composition and pattern forming method TOKYO OHKA KOGYO CO., LTD. (JP) 2026-01-13 US disclosed
US-20250333548-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-10-30 US disclosed
US-20250321481-A1 PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-10-16 US disclosed
US-12422749-B2 Photosensitive ink composition, cured product, display panel, and method for producing cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2025-09-23 US disclosed
US-20250289926-A1 CURABLE COMPOSITION FOR INSULATING FILM FORMATION, INSULATING FILM FORMATION METHOD, AND TERMINALLY MALEIMIDE-MODIFIED POLYPHENYLENE ETHER RESIN TOKYO OHKA KOGYO CO LTD (JP) 2025-09-18 US disclosed
US-20250282900-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2025-09-11 US disclosed
US-12379664-B2 Photosensitive ink composition, cured product, display panel, and method for producing cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2025-08-05 US disclosed
US-20250189891-A1 POLYIMIDE RESIN PRECURSOR TOKYO OHKA KOGYO CO., LTD. (JP) 2025-06-12 US disclosed
US-20050130055-A1 Method and removing resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2005-06-16 US disclosed
EP-1338436-A2 Aluminum support for lithographic printing plate, method of preparing the same and presensitized plate using the same FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed
EP-0671661-B1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1999-08-25 EP disclosed
EP-0633500-B1 Photosensitive composition and process for image formation FUJI PHOTO FILM CO LTD (JP) 1998-11-11 EP disclosed
EP-0684521-B1 Positive working photosensitive compositions FUJI PHOTO FILM CO LTD (JP) 1998-01-14 EP disclosed
EP-0684521-A1 Positive working photosensitive compositions FUJI PHOTO FILM CO., LTD. (JP) 1995-11-29 EP disclosed
EP-0671661-A2 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
EP-0633500-A1 Photosensitive composition and process for image formation FUJI PHOTO FILM CO., LTD. (JP) 1995-01-11 EP disclosed
US-5180653-A Triazine Compound, Cresol Novolak, Alkoxymethylated Melamine TOKYO OHKA KOGYO CO., LTD. (JP) 1993-01-19 US disclosed
US-5057397-A Fine patterning of semiconductor TOKYO OHKA KOGYO CO., LTD. (JP) 1991-10-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260085194-A1 OPTICAL PRODUCT PFN1, CFL1, C9 RAB9A 2794/4885NPC1 2724/4885SMN1; SMN2 82/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.