⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16573518 | 0.88 | — | — | |
| SCHEMBL16329057 | 0.82 | DNM1 (0.31) | — | |
| SCHEMBL9924092 | 0.81 | ALDH1A1 (0.34) | — | |
| SCHEMBL16329429 | 0.79 | — | — | |
| SCHEMBL15296905 | 0.78 | GAA (0.38) | — | |
| SCHEMBL9924190 | 0.78 | MMP8 (0.32) | — | |
| SCHEMBL15743559 | 0.76 | THRB (0.41) | — | |
| SCHEMBL15743549 | 0.76 | THRB (0.40) | — | |
| SCHEMBL9924189 | 0.74 | — | — | |
| SCHEMBL12083658 | 0.71 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120146264-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110091814-A1 | PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100068470-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |