⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9927417 | 0.93 | FKBP1A (0.30) | — | |
| SCHEMBL9927414 | 0.85 | FKBP1A (0.31) | — | |
| SCHEMBL9927420 | 0.84 | FKBP1A (0.30) | — | |
| SCHEMBL9927416 | 0.80 | PRKCA (0.30) | — | |
| SCHEMBL17247984 | 0.79 | — | — | |
| SCHEMBL9927407 | 0.77 | — | — | |
| SCHEMBL12902880 | 0.77 | ABCB11 (0.30) | — | |
| SCHEMBL11941668 | 0.76 | FKBP1A (0.31) | — | |
| SCHEMBL9927405 | 0.76 | — | — | |
| SCHEMBL17247982 | 0.75 | CCR2 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |