Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | XBP1 | P17861 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18233435 | 0.88 | — | — | |
| SCHEMBL13713815 | 0.83 | ALDH1A1 (0.34) | ALDH1A1THRB | |
| SCHEMBL25699050 | 0.83 | ALDH1A1 (0.34) | ALDH1A1THRB | |
| SCHEMBL13713882 | 0.82 | ALDH1A1 (0.33) | ALDH1A1KMT2ATHRB | |
| SCHEMBL673334 | 0.82 | ALDH1A1 (0.39) | ALDH1A1THRB | |
| SCHEMBL5918108 | 0.81 | ALDH1A1 (0.33) | ALDH1A1THRB | |
| SCHEMBL14519267 | 0.81 | ALDH1A1 (0.33) | ALDH1A1THRB | |
| SCHEMBL20378427 | 0.80 | ALDH1A1 (0.34) | ALDH1A1THRB | |
| SCHEMBL23563209 | 0.79 | MAPT (0.30) | MAPTXBP1HTTKMT2APAX8 | |
| SCHEMBL25699054 | 0.79 | ALDH1A1 (0.32) | ALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9562122-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9562122-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-8535871-B2 | Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer | JSR CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8535871-B2 | Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer | JSR CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8535871-B2 | Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer | JSR CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | RER1, PRMT1, REV1 | ALDH1A1 2002/4885MAPT 2746/4885XBP1 3186/4885 |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RFC1, RFC2 | ALDH1A1 1147/4885MAPT 4107/4885XBP1 2520/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.