SCHEMBL9929460

SCHEMBL9929460

CC(=CCC(C)C1C2CC3CC(C2)CC1C3)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.35
CD81 P60033 2/20 0.34
EPHX1 P07099 1/20 0.34
EPHX2 P34913 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.30
MAPT P10636 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9929739 0.78 HPGD (0.43) SMN1; SMN2L3MBTL1
SCHEMBL9929189 0.78 NPSR1 (0.33) CD81SMN1; SMN2
SCHEMBL23522249 0.72 GLA (0.34) CD81EPHX1SMN1; SMN2MAPT
SCHEMBL5429712 0.71 GLA (0.36) CD81EPHX1SMN1; SMN2MAPT
SCHEMBL3904262 0.70 HSD11B1 (0.42) HSD11B1EPHX1EPHX2MAPTL3MBTL1
SCHEMBL2967397 0.70 FDFT1 (0.38) HSD11B1CD81EPHX1MAPTL3MBTL1
SCHEMBL2967393 0.70 FDFT1 (0.38) HSD11B1CD81EPHX1MAPTL3MBTL1
SCHEMBL10007941 0.70 HSD11B1 (0.40) HSD11B1
SCHEMBL23252 0.69 GRIK1 (0.47) CD81TDP1
SCHEMBL23250 0.69 GRIK1 (0.47) CD81TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8758978-B2 Radiation-sensitive resin composition, resist pattern formation method, and polymer JSR CORPORATION (JP) 2014-06-24 US disclosed
US-8535871-B2 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer JSR CORPORATION (JP) 2013-09-17 US disclosed
US-20120171612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER JSR CORPORATION (JP) 2012-07-05 US disclosed
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER JSR CORPORATION (JP) 2012-06-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER RER1, PRMT1, REV1 HSD11B1 3550/4885CD81 1648/4885EPHX1 833/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.