Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDFT1 | P37268 | 2/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | CD81 | P60033 | 2/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2967393 | 1.00 | FDFT1 (0.38) | FDFT1HSD11B1CD81EPHX1SCN9A | |
| SCHEMBL3280822 | 0.74 | HSD11B1 (0.35) | HSD11B1EPHX1MAPT | |
| SCHEMBL2434576 | 0.72 | HSD11B1 (0.38) | FDFT1HSD11B1EPHX1 | |
| SCHEMBL19798408 | 0.71 | HSD11B1 (0.38) | FDFT1HSD11B1EPHX1SCN9AL3MBTL1 | |
| SCHEMBL3369271 | 0.70 | CD81 (0.37) | CD81 | |
| SCHEMBL9929460 | 0.70 | HSD11B1 (0.35) | HSD11B1CD81EPHX1MAPTL3MBTL1 | |
| SCHEMBL465988 | 0.69 | EPHX1 (0.36) | CD81EPHX1 | |
| SCHEMBL16284412 | 0.69 | HSD11B1 (0.48) | FDFT1HSD11B1EPHX1SCN9AL3MBTL1 | |
| SCHEMBL2739903 | 0.68 | HSD11B1 (0.36) | FDFT1HSD11B1EPHX1SCN9AL3MBTL1 | |
| SCHEMBL21385044 | 0.68 | HSD11B1 (0.40) | FDFT1HSD11B1EPHX1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2399169-B1 | ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS | BREWER SCIENCE INC (US) | 2019-04-17 | — | — | EP | disclosed |
| US-7858286-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7803512-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-28 | — | — | US | disclosed |
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20090098483-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHA KOGYO CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| WO-2009038635-A1 | PROCESS FOR PREPARING COMPOSITIONALLY UNIFORM COPOLYMERS | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2009-03-26 | — | — | WO | disclosed |
| US-20090076230-A1 | Process for preparing compositionally uniform copolymers | DUPONT ELECTRONIC POLYMERS L.P. | 2009-03-19 | — | — | US | disclosed |
| US-20090068588-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |
| US-20090042148-A1 | Photoresist Composition for Deep UV and Process Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-12 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |