Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.52 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.52 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.51 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.51 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.51 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.51 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | BBOX1 | O75936 | 2/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 4/20 | 0.44 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.42 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9936229 | 0.98 | ALDH1A1 (0.55) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| Bromide SCHEMBL11132066 | 0.93 | CTDSP1 (0.51) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| SCHEMBL11133958 | 0.93 | ALDH1A1 (0.54) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| Bromide SCHEMBL11133572 | 0.91 | ALDH1A1 (0.52) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| Bromide SCHEMBL11133578 | 0.91 | ALDH1A1 (0.52) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| SCHEMBL18917600 | 0.90 | CHRNA7 (0.48) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| Water SCHEMBL21143569 | 0.88 | CHRNA7 (0.47) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| SCHEMBL9935073 | 0.88 | KCNH2 (0.49) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| SCHEMBL18917605 | 0.87 | CHRNA7 (0.50) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A | |
| SCHEMBL9935058 | 0.86 | ALDH1A1 (0.51) | KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11839700-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11783958-B2 | Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11733608-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-22 | — | — | US | disclosed |
| US-11733608-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-22 | — | — | US | disclosed |
| US-11720018-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20180223133-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| US-20180168470-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-21 | — | — | US | disclosed |
| US-20180143532-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-24 | — | — | US | disclosed |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| EP-2474527-B1 | IONIC LIQUID CONTAINING ALLYLSULFONATE ANION | WAKO PURE CHEM IND LTD (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-9052602-B2 | Developer for photosensitive resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20140370441-A1 | DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-18 | — | — | US | disclosed |
| US-8546609-B2 | Ionic liquid containing allylsulfonate anion | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-2474527-A1 | IONIC LIQUID CONTAINING ALLYLSULFONATE ANION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120157680-A1 | IONIC LIQUID CONTAINING ALLYLSULFONATE ANION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120157680-A1 | IONIC LIQUID CONTAINING ALLYLSULFONATE ANION | ATXN2L, ARL1, INPPL1 | KDM4E 4681/4885CTDSP1 1265/4885ALDH1A1 3717/4885 |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SLC9A1, FN1, EPCAM | KDM4E 2446/4885CTDSP1 3501/4885ALDH1A1 749/4885 |
| US-11733608-B2 | Resist composition and patterning process | HNRNPU, INSR, BICRA | KDM4E 2427/4885CTDSP1 830/4885ALDH1A1 4872/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.