SCHEMBL9935176

SCHEMBL9935176

C[N+]1(CCCc2ccccc2)CCCC1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.54
CTDSP1 Q9GZU7 1/20 0.54
ALDH1A1 P00352 2/20 0.52
MAPT P10636 1/20 0.52
APOBEC3A P31941 1/20 0.52
APOBEC3G Q9HC16 1/20 0.52
CHRM2 P08172 2/20 0.51
CHRM3 P20309 2/20 0.51
CHRM4 P08173 1/20 0.51
CHRM5 P08912 1/20 0.51
CHRM1 P11229 1/20 0.51
HPGD P15428 1/20 0.46
KMT2A Q03164 1/20 0.46
BBOX1 O75936 2/20 0.44
CHRNA7 P36544 4/20 0.44
CHRNB2 P17787 1/20 0.42
CHRNB4 P30926 1/20 0.42
CHRNA3 P32297 1/20 0.42
CHRNA4 P43681 1/20 0.42
CHRNA10 Q9GZZ6 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9936229 0.98 ALDH1A1 (0.55) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
Bromide SCHEMBL11132066 0.93 CTDSP1 (0.51) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
SCHEMBL11133958 0.93 ALDH1A1 (0.54) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
Bromide SCHEMBL11133572 0.91 ALDH1A1 (0.52) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
Bromide SCHEMBL11133578 0.91 ALDH1A1 (0.52) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
SCHEMBL18917600 0.90 CHRNA7 (0.48) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
Water SCHEMBL21143569 0.88 CHRNA7 (0.47) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
SCHEMBL9935073 0.88 KCNH2 (0.49) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
SCHEMBL18917605 0.87 CHRNA7 (0.50) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A
SCHEMBL9935058 0.86 ALDH1A1 (0.51) KDM4ECTDSP1ALDH1A1MAPTAPOBEC3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 US disclosed
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 US disclosed
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-20240215890-A1 Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 US disclosed
US-11783958-B2 Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11733608-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 US disclosed
US-11733608-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 US disclosed
US-11720018-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-20180223133-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-09 US disclosed
US-20180168470-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-21 US disclosed
US-20180143532-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 US disclosed
EP-2474527-B1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION WAKO PURE CHEM IND LTD (JP) 2017-01-25 EP disclosed
US-9052602-B2 Developer for photosensitive resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-09 US disclosed
US-20140370441-A1 DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-18 US disclosed
US-8546609-B2 Ionic liquid containing allylsulfonate anion WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2013-10-01 US disclosed
EP-2474527-A1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION Wako Pure Chemical Industries, Ltd. (JP) 2012-07-11 EP disclosed
US-20120157680-A1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120157680-A1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION ATXN2L, ARL1, INPPL1 KDM4E 4681/4885CTDSP1 1265/4885ALDH1A1 3717/4885
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SLC9A1, FN1, EPCAM KDM4E 2446/4885CTDSP1 3501/4885ALDH1A1 749/4885
US-11733608-B2 Resist composition and patterning process HNRNPU, INSR, BICRA KDM4E 2427/4885CTDSP1 830/4885ALDH1A1 4872/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.