Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3079816 | 1.00 | ESR1 (0.38) | ESR1ESR2 | |
| SCHEMBL4229838 | 0.83 | ESR1 (0.38) | ESR1ESR2 | |
| SCHEMBL2701262 | 0.81 | FUCA1 (0.37) | ESR1ESR2 | |
| SCHEMBL5907203 | 0.80 | APLNR (0.30) | — | |
| SCHEMBL17835247 | 0.77 | P2RX7 (0.32) | — | |
| SCHEMBL17835252 | 0.77 | P2RX7 (0.32) | — | |
| SCHEMBL17835249 | 0.77 | P2RX7 (0.32) | — | |
| SCHEMBL11046887 | 0.74 | ALDH1A1 (0.39) | ESR1ESR2 | |
| SCHEMBL24064819 | 0.73 | ESR1 (0.36) | ESR1ESR2 | |
| SCHEMBL19381561 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020234128-A1 | PROCESS FOR PRODUCING 2,2-DIALKYL-3-ACYLOXYPROPANALS | SIKA TECHNOLOGY AG (CH) | 2020-11-26 | — | — | WO | disclosed |
| EP-3394139-A1 | POLYURETHANE COMPOSITION WITH LOWER PLASTICISER MIGRATION | Sika Technology AG (CH) | 2018-10-31 | — | — | EP | disclosed |
| WO-2017108834-A1 | POLYURETHANE COMPOSITION WITH LOWER PLASTICISER MIGRATION | SIKA TECHNOLOGY AG (CH) | 2017-06-29 | — | — | WO | disclosed |
| US-9017931-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017931-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140051026-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20140051026-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-20 | — | — | US | disclosed |
| EP-2651876-A1 | POLYAMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS | Sika Technology AG (CH) | 2013-10-23 | — | — | EP | disclosed |
| WO-2012080265-A1 | POLYAMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS | SIKA TECHNOLOGY AG (CH) | 2012-06-21 | — | — | WO | disclosed |