SCHEMBL9949515

SCHEMBL9949515

CCCC1CCC(C(C)c2cccc(C=O)c2)CC1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.38
DRD1 P21728 1/20 0.38
DRD4 P21917 1/20 0.38
DRD5 P21918 1/20 0.38
DRD3 P35462 1/20 0.38
ALDH1A1 P00352 4/20 0.35
CYP2C9 P11712 1/20 0.32
MAPT P10636 2/20 0.32
HTT P42858 1/20 0.32
LMNA P02545 1/20 0.31
SLC6A2 P23975 2/20 0.31
SLC6A4 P31645 2/20 0.31
SLC6A3 Q01959 2/20 0.31
ALDH3A1 P30838 1/20 0.31
ALDH1A3 P47895 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9950928 0.90 DRD2 (0.32) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9949871 0.89 DRD2 (0.36) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9950061 0.86 DRD2 (0.38) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9949675 0.83 TYR (0.43) ALDH1A1CYP2C9MAPTHTTLMNA
SCHEMBL9949806 0.82 ALDH1A1 (0.36) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9949702 0.80 IDO1 (0.38) DRD2DRD1DRD4DRD5DRD3
Ethylene SCHEMBL9949909 0.80 DRD2 (0.31) DRD2DRD1DRD4DRD5DRD3
SCHEMBL8483120 0.78 GAA (0.39) ALDH1A1CYP2C9MAPTLMNA
SCHEMBL1031530 0.78 GAA (0.39) ALDH1A1CYP2C9MAPTLMNA
Ethylene SCHEMBL9950575 0.78 DRD2 (0.33) DRD2DRD1DRD4DRD5DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 DRD2 2661/4885DRD1 1092/4885DRD4 3195/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.