Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRC | P12931 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene SCHEMBL9950727 | 0.91 | SRC (0.31) | SRC | |
| Ethylene SCHEMBL9950785 | 0.90 | SRC (0.31) | SRC | |
| Ethylene SCHEMBL9949388 | 0.90 | SRC (0.38) | SRC | |
| Ethylene SCHEMBL9950804 | 0.90 | HTR1A (0.33) | — | |
| Ethylene SCHEMBL9951035 | 0.89 | SRC (0.31) | SRC | |
| SCHEMBL9950508 | 0.87 | SRC (0.36) | SRC | |
| Ethylene SCHEMBL9950383 | 0.84 | HTR1A (0.32) | — | |
| Ethylene SCHEMBL9950554 | 0.83 | HTR1A (0.32) | — | |
| Ethylene SCHEMBL9950825 | 0.83 | SRC (0.30) | SRC | |
| Ethylene SCHEMBL9951428 | 0.82 | SRC (0.31) | SRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8748078-B2 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-06-10 | — | — | US | disclosed |
| EP-2476662-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, RER1, REV1 | SRC 3498/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.