Ethylene

Ethylene

SCHEMBL9950719

C=C.CCC(Cc1ccccc1C=O)C1CCCCC1.CCOC(C)OCC

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
KDM4E B2RXH2 1/20 0.32
SRC P12931 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
KMT2A Q03164 1/20 0.30
PKM P14618 1/20 0.30
CTDSP1 Q9GZU7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9952104 0.91 TSHR (0.31) TSHRSRCPKMCTDSP1
Ethylene SCHEMBL9950623 0.90 TSHR (0.31) TSHRSRCPKMCTDSP1
Ethylene SCHEMBL9951360 0.90 TSHR (0.33) TSHRKDM4ESRCL3MBTL1KMT2A
SCHEMBL9951341 0.88 KMT2A (0.36) TSHRKDM4ESRCKMT2APKM
Ethylene SCHEMBL9949389 0.83 TSHR (0.32) TSHRSRCL3MBTL1PKMCTDSP1
Ethylene SCHEMBL9949388 0.82 SRC (0.38) TSHRSRCL3MBTL1KMT2A
Ethylene SCHEMBL9949742 0.81 TSHR (0.31) TSHRSRCPKMCTDSP1
Ethylene SCHEMBL9950628 0.81 SRC (0.37) SRCKMT2A
Ethylene SCHEMBL9949827 0.79 SLC18A2 (0.30)
Ethylene SCHEMBL9950208 0.79 CA1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 TSHR 1248/4885KDM4E 3683/4885SRC 3498/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.