SCHEMBL9951341

SCHEMBL9951341

CCC(Cc1ccccc1C=O)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.36
PKM P14618 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
SRC P12931 1/20 0.35
MEN1 O00255 2/20 0.34
LMNA P02545 2/20 0.34
THRB P10828 1/20 0.34
BLM P54132 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
SHBG P04278 1/20 0.34
TSHR P16473 4/20 0.33
ALDH1A1 P00352 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CHRM2 P08172 1/20 0.32
HTR1A P08908 1/20 0.32
ADRA2A P08913 1/20 0.32
CHRM1 P11229 1/20 0.32
DRD1 P21728 1/20 0.32
SLC6A2 P23975 1/20 0.32
ADRA1A P35348 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950904 0.89 PKM (0.37) KMT2APKMCTDSP1SRCMEN1
Ethylene SCHEMBL9950719 0.88 TSHR (0.32) KMT2APKMCTDSP1SRCTSHR
SCHEMBL9950380 0.87 PKM (0.36) KMT2APKMCTDSP1SRCMEN1
SCHEMBL9949971 0.84 SRC (0.36) KMT2APKMCTDSP1SRCMEN1
Ethylene SCHEMBL9952104 0.78 TSHR (0.31) PKMCTDSP1SRCTSHR
Ethylene SCHEMBL9950623 0.78 TSHR (0.31) PKMCTDSP1SRCTSHRALDH1A1
SCHEMBL12744036 0.77 KMT2A (0.38) KMT2ASRCMEN1LMNATSHR
Ethylene SCHEMBL9951360 0.76 TSHR (0.33) KMT2APKMCTDSP1SRCMEN1
SCHEMBL9950378 0.75 ALDH1A1 (0.38) KMT2APKMCTDSP1SRCMEN1
SCHEMBL16191154 0.74 TDP1 (0.43) PKMCTDSP1TDP1SHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 KMT2A 3487/4885PKM 1608/4885CTDSP1 846/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.