Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.55 |
| ▸ | MAPT | P10636 | 3/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | ATM | Q13315 | 1/20 | 0.55 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.50 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 5/20 | 0.46 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | LTA4H | P09960 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.44 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 3/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.42 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28534675 | 0.91 | MAPT (0.45) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL24380499 | 0.91 | MAPT (0.45) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL534639 | 0.89 | CALM1 (0.63) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL10707308 | 0.87 | CALM1 (0.60) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL2140291 | 0.87 | CALM1 (0.67) | SMN1; SMN2MAPTALDH1A1CALM1LMNA | |
| SCHEMBL275839 | 0.87 | CALM1 (0.67) | SMN1; SMN2MAPTALDH1A1CALM1LMNA | |
| SCHEMBL20367080 | 0.86 | SRD5A2 (0.46) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| Ethane SCHEMBL7512728 | 0.84 | CALM1 (0.63) | SMN1; SMN2MAPTALDH1A1CALM1LMNA | |
| SCHEMBL4116259 | 0.83 | CALM1 (0.55) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL17283459 | 0.82 | TDP1 (0.54) | SMN1; SMN2MAPTNPSR1ALDH1A1ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1772774-A2 | Photoinitiated reactions | Lintfield Limited (GB) | 2007-04-11 | — | — | EP | claimed |
| EP-1307783-A2 | PHOTOINITIATED REACTIONS | Lintfield Limited (GB) | 2003-05-07 | — | — | EP | claimed |
| WO-2002012350-A2 | PHOTOINITIATED REACTIONS | LINTFIELD LIMITED (GB) | 2002-02-14 | — | — | WO | claimed |
| EP-4737530-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION AND ADHESIVE SHEET | Toagosei Co., Ltd. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-12601971-B2 | Negative photosensitive resin composition | ZEON CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-12540252-B2 | Active energy ray-curable inkjet ink, and printed matter | ARTIENCE CO., LTD. (JP) | 2026-02-03 | — | — | US | disclosed |
| US-12473471-B2 | Laminate, production method therefor, and automotive exterior material | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| EP-4269112-B1 | ULTRAVIOLET CURABLE INKJET INK SET AND PRODUCTION METHOD OF PRINTED MATTER | ARTIENCE CO LTD (JP) | 2025-10-08 | — | — | EP | disclosed |
| US-20250092171-A1 | HIGH-PURITY 4-(2-BROMOETHYL)BENZENESULFONIC ACID, HIGH-PURITY STYRENESULFONIC ACID COMPOUND DERIVED THEREFROM, AND POLYMER THEREOF, AND METHODS FOR PRODUCING SAME | TOSOH FINECHEM CORPORATION (JP) | 2025-03-20 | — | — | US | disclosed |
| US-20250034308-A1 | PHOTOCURABLE SILICONE RESIN COMPOSITION AND CURED PRODUCT THEREOF | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2025-01-30 | — | — | US | disclosed |
| WO-2025005046-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION AND ADHESIVE SHEET | 東亞合成株式会社 | 2025-01-02 | — | — | WO | disclosed |
| WO-2001062834-A1 | SURFACE TREATMENT OF PLASTIC MATERIAL WITH AN ORGANIC POLYMERISABLE AND/OR CROSSLINKABLE COMPOSITION HAVING REACTIVE FUNCTIONS | RHODIA CHIMIE (FR) | 2001-08-30 | — | — | WO | disclosed |
| WO-2001036512-A1 | RADIATION POLYMERISABLE AND/OR CROSSLINKABLE ADHESIVE FOR PLASTIC BASED ON MATRIX WITH REACTIVE FUNCTIONS | RHODIA CHIMIE (FR) | 2001-05-25 | — | — | WO | disclosed |
| EP-0970405-A1 | UE | RHODIA CHIMIE (FR) | 2000-01-12 | — | — | EP | disclosed |
| EP-0899091-A2 | Transparent coated molded product and method for producing the same | Asahi Glass Company Ltd. (JP) | 1999-03-03 | — | — | EP | disclosed |
| WO-1998043134-A1 | (E.G. INK OR VARNISH) COMPOSITION POLYMERISABLE AND/OR CROSSLINKABLE UNDER RADIATION EXPOSURE BY CATIONIC AND/OR RADICAL PROCESS, WITH AN ORGANIC MATRIX BASE, OF A DILUENT AND A PHOTOINITIATOR | RHODIA CHIMIE (FR) | 1998-10-01 | — | — | WO | disclosed |
| EP-0568853-B1 | Photoenhanced diffusion patterning for organic polymer films | DU PONT (US) | 1998-08-05 | — | — | EP | disclosed |
| EP-0569762-A1 | Pattern formation in photohardenable dielectric layers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-18 | — | — | EP | disclosed |
| EP-0568853-A1 | Photoenhanced diffusion patterning for organic polymer films | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-10 | — | — | EP | disclosed |
| US-5260163-A | Photoenhanced diffusion patterning for organic polymer films | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12540252-B2 | Active energy ray-curable inkjet ink, and printed matter | ACP1, MARK1, ACVRL1 | SMN1; SMN2 614/4885MAPT 644/4885NPSR1 4625/4885 |
| US-12601971-B2 | Negative photosensitive resin composition | ARCN1, RAD51, RER1 | SMN1; SMN2 2912/4885MAPT 2464/4885NPSR1 3202/4885 |
| US-20250092171-A1 | HIGH-PURITY 4-(2-BROMOETHYL)BENZENESULFONIC ACID, HIGH-PURITY STYRENESULFONIC ACID COMPOUND DERIVED THEREFROM, AND POLYMER THEREOF, AND METHODS FOR PRODUCING SAME | BRPF1, WEE2, WEE1 | SMN1; SMN2 1231/4885MAPT 2281/4885NPSR1 3491/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.