SCHEMBL99595

SCHEMBL99595

Cc1ccccc1Sc1ccc(-c2ccccc2C)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
AR P10275 2/20 0.41
HAO1 Q9UJM8 1/20 0.39
ENPP3 O14638 1/20 0.38
ENPP1 P22413 1/20 0.38
MAPT P10636 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HKDC1 Q2TB90 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
FFAR1 O14842 1/20 0.37
MAPK1 P28482 2/20 0.37
KDM4E B2RXH2 1/20 0.37
NSD2 O96028 1/20 0.37
MCL1 Q07820 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3282094 0.88 CA12 (0.50) CA12CA1CA2CA9AR
SCHEMBL15418919 0.84 AR (0.43) ARHAO1MAPTL3MBTL1TDP1
SCHEMBL959972 0.82 MEN1 (0.52) CA12CA1CA2CA9ENPP3
Ethane SCHEMBL28136904 0.82 AR (0.42) ARHAO1MAPTL3MBTL1TDP1
SCHEMBL181632 0.82 ALDH1A1 (0.46) CA12CA1CA2CA9AR
SCHEMBL6716919 0.80 AR (0.44) ARHAO1L3MBTL1TDP1FFAR1
SCHEMBL30670355 0.79 HTR1A (0.49) ARHAO1MAPTL3MBTL1MEN1
SCHEMBL11602202 0.79 HTR1A (0.49) ARHAO1MAPTL3MBTL1MEN1
SCHEMBL2876479 0.79 L3MBTL1 (0.50) CA1CA2CA9ARHAO1
SCHEMBL29580858 0.79 L3MBTL1 (0.50) CA1CA2CA9ARHAO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4737530-A1 ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION AND ADHESIVE SHEET Toagosei Co., Ltd. (JP) 2026-05-06 EP disclosed
US-12601971-B2 Negative photosensitive resin composition ZEON CORPORATION (JP) 2026-04-14 US disclosed
US-12473471-B2 Laminate, production method therefor, and automotive exterior material MITSUBISHI CHEMICAL CORPORATION (JP) 2025-11-18 US disclosed
US-20250034308-A1 PHOTOCURABLE SILICONE RESIN COMPOSITION AND CURED PRODUCT THEREOF NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2025-01-30 US disclosed
WO-2025005046-A1 ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION AND ADHESIVE SHEET 東亞合成株式会社 2025-01-02 WO disclosed
WO-2024241686-A1 VINYL POLYMER, AND ACTIVE ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME 東亞合成株式会社 2024-11-28 WO disclosed
WO-2024214490-A1 RESIN COMPOSITION, CURED RESIN PRODUCT, METHOD FOR PRODUCING CURED RESIN PRODUCT, ELECTRONIC DEVICE, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND RESIN SHEET 三井化学株式会社 2024-10-17 WO disclosed
WO-2024181011-A1 RESIN COMPOSITION 日本ゼオン株式会社 2024-09-06 WO disclosed
WO-2024122452-A1 METHOD FOR PRODUCING (METH)ACRYLATE MIXTURE, METHOD FOR PRODUCING CURABLE COMPOSITION, AND METHOD FOR PRODUCING ACTIVE ENERGY RAY CURABLE COMPOSITION 東亞合成株式会社 2024-06-13 WO disclosed
WO-2024106476-A1 PHOTOCURABLE COMPOSITION FOR LITHIUM ION SECONDARY BATTERY SEALING MATERIALS 東亞合成株式会社 2024-05-23 WO disclosed
US-20090283937-A1 CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2009-11-19 US disclosed
EP-2110394-A1 PHOTOCURABLE LIQUID RUBBER COMPOSITION Bridgestone Corporation (JP) 2009-10-21 EP disclosed
EP-2078738-A1 CONDUCTIVE INK, CONDUCTIVE CIRCUIT AND NON-CONTACT MEDIA Toyo Ink Manufacturing CO., LTD. (JP) 2009-07-15 EP disclosed
US-20090011367-A1 INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2009-01-08 US disclosed
EP-1953175-A1 METHOD FOR PRODUCING PHOTOCURABLE LIQUID RESIN AND PHOTOCURABLE LIQUID RESIN PRODUCED BY SUCH METHOD Bridgestone Corporation (JP) 2008-08-06 EP disclosed
US-20080076846-A1 Energy Ray-Curable Ink Composition HITACHI MAXELL, LTD. (JP) 2008-03-27 US disclosed
US-7026372-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-04-11 US disclosed
US-20050154073-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2005-07-14 US disclosed
US-6872333-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) 2005-03-29 US disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12601971-B2 Negative photosensitive resin composition ARCN1, RAD51, RER1 CA12 2125/4885CA1 1447/4885CA2 1898/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.