SCHEMBL996453

SCHEMBL996453

[Al+3].[Al+3].[Al+3].[N-3].[N-3].[N-3].[N-3].[N-3].[N-3].[N-3].[SiH4].[SiH4].[SiH4].[Ti+4].[Ti+4].[Ti+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1918346 0.89
SCHEMBL715681 0.87
SCHEMBL165432 0.87
SCHEMBL73746 0.87
SCHEMBL890500 0.87
SCHEMBL10391969 0.87
SCHEMBL16314 0.87
SCHEMBL2219027 0.87
SCHEMBL9989320 0.75
SCHEMBL3962334 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114888368-B Method for improving machining precision of stainless steel CG internal thread 贵州永红航空机械有限责任公司 2023-08-04 CN claimed
CN-114888368-B Method for improving machining precision of stainless steel CG internal thread 贵州永红航空机械有限责任公司 2023-08-04 CN disclosed
US-10026607-B2 Substrate processing apparatus for forming film including at least two different elements HITACHI KOKUSAI ELECTRIC, INC. (JP) 2018-07-17 US disclosed
US-10020338-B2 Backside illuminated image sensor INTELLECTUAL VENTURES II LLC (US) 2018-07-10 US disclosed
US-20170200599-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST TWO DIFFERENT ELEMENTS Kokusai Electric Corporation (JP) 2017-07-13 US disclosed
US-9553122-B2 Backside illuminated image sensor INTELLECTUAL VENTURES II LLC (US) 2017-01-24 US disclosed
US-20160329208-A1 SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST TWO DIFFERENT ELEMENTS Kokusai Electric Corporation (JP) 2016-11-10 US disclosed
US-9487861-B2 Substrate processing apparatus capable of forming films including at least two different elements HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-11-08 US disclosed
US-9478417-B2 Method of manufacturing semiconductor device for forming film including at least two different elements HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-10-25 US disclosed
US-20160298236-A1 SUBTRATE PROCESSING APPARATUS CAPABLE FORMING FILM INCLUDING AT LEAST TWO DIFFERENT ELEMENTS Kokusai Electric Corporation (JP) 2016-10-13 US disclosed
US-8420438-B2 Backside illuminated image sensor INTELLECTUAL VENTURES II, LLC (US) 2013-04-16 US disclosed
US-8409988-B2 Method of manufacturing semiconductor device and substrate processing apparatus HITACHI KOKUSAI ELECTRIC INC. (JP) 2013-04-02 US disclosed
EP-2565926-A1 Backside illuminated image sensor Intellectual Ventures II LLC (US) 2013-03-06 EP disclosed
US-20110294280-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS HITACHI KOKUSAI ELECTRIC INC. (JP) 2011-12-01 US disclosed
US-20110223707-A1 Backside Illuminated Image Sensor INTELLECTUAL VENTURES II LLC 2011-09-15 US disclosed
EP-2361440-A1 BACKSIDE ILLUMINATED IMAGE SENSOR Crosstek Capital, LLC (US) 2011-08-31 EP disclosed
US-7875948-B2 Backside illuminated image sensor INTELLECTUAL VENTURES II LLC 2011-01-25 US disclosed
US-20100130024-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS HITACHI-KOKUSAI ELECTRIC INC. (JP) 2010-05-27 US disclosed
WO-2010048291-A1 BACKSIDE ILLUMINATED IMAGE SENSOR Crosstek Capital, LLC (US) 2010-04-29 WO disclosed
US-20100096718-A1 BACKSIDE ILLUMINATED IMAGE SENSOR INTELLECTUAL VENTURES II LLC 2010-04-22 US disclosed