SCHEMBL9973243

SCHEMBL9973243

O=P(Oc1ccc2ccc3cccc4ccc1c2c34)(c1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.40
ERBB2 P04626 1/20 0.40
FYN P06241 1/20 0.40
MAOA P21397 1/20 0.40
ACHE P22303 1/20 0.40
AHR P35869 1/20 0.40
ALDH1A1 P00352 7/20 0.39
HPGD P15428 5/20 0.39
HSD17B10 Q99714 4/20 0.39
KMT2A Q03164 4/20 0.39
KDM4E B2RXH2 4/20 0.39
MEN1 O00255 2/20 0.39
GLA P06280 1/20 0.39
POLB P06746 1/20 0.39
CYP2D6 P10635 1/20 0.39
THRB P10828 1/20 0.38
L3MBTL1 Q9Y468 4/20 0.38
TDP1 Q9NUW8 3/20 0.38
CYP3A4 P08684 2/20 0.38
TSHR P16473 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30332098 0.81 ALDH1A1 (0.44) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL3473759 0.80 HTT (0.48) ALDH1A1HPGDHSD17B10KMT2AKDM4E
SCHEMBL11806334 0.79 CYP1A2 (0.39) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL4521607 0.78 INPPL1 (0.48) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL27947558 0.78 MAPT (0.43) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL9973244 0.78 ALDH1A1 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL21969523 0.78 GPR84 (0.42) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL30912783 0.77 MAPT (0.50) ALDH1A1HSD17B10KMT2AMEN1POLB
SCHEMBL29035773 0.74 ALDH1A1 (0.40) ALDH1A1HPGDKMT2AKDM4EMEN1
SCHEMBL15759125 0.74 ALDH1A1 (0.33) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741539-B2 Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern CHEIL INDUSTRIES, INC. (KR) 2014-06-03 US disclosed
US-8741539-B2 Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern CHEIL INDUSTRIES, INC. (KR) 2014-06-03 US disclosed
US-20120153424-A1 HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN CHEIL INDUSTRIES, INC. (KR) 2012-06-21 US disclosed
US-20120153424-A1 HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN CHEIL INDUSTRIES, INC. (KR) 2012-06-21 US disclosed