SCHEMBL9998674

SCHEMBL9998674

C=C(C)C(=O)Oc1ccc(OCC2C3CC4CC(C3)CC2C4)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.45
ATM Q13315 1/20 0.45
ELANE P08246 1/20 0.44
SCN9A Q15858 4/20 0.38
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
EPHX2 P34913 1/20 0.34
CYP4F2 P78329 1/20 0.34
CYP4A11 Q02928 1/20 0.34
HSD11B1 P28845 1/20 0.33
PARP15 Q460N3 1/20 0.33
PARP10 Q53GL7 1/20 0.33
PARP2 Q9UGN5 1/20 0.33
CNR2 P34972 1/20 0.33
MEN1 O00255 1/20 0.33
RAB9A P51151 1/20 0.33
ALDH1A1 P00352 1/20 0.33
FFAR4 Q5NUL3 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12021208 0.81 KMT2A (0.43) KMT2AATMELANESCN9APOLB
SCHEMBL24709164 0.77 ALDH1A1 (0.55) KMT2AATMELANEPOLBAPEX1
SCHEMBL19789519 0.76 PARP10 (0.57) KMT2AATMELANEPARP15PARP10
SCHEMBL1061355 0.76 ALDH1A1 (0.51) SCN9AEPHX2HSD11B1ALDH1A1
SCHEMBL56436 0.74 ELANE (0.69) KMT2AATMELANEPOLBAPEX1
SCHEMBL4403982 0.74 ALDH1A1 (0.51) KMT2AATMELANETDP1MEN1
SCHEMBL7603742 0.74 ALDH1A1 (0.51) KMT2AATMELANEPOLBAPEX1
SCHEMBL452749 0.74 ELANE (0.56) KMT2AATMELANEPOLBAPEX1
SCHEMBL11229036 0.74 POLB (0.56) KMT2AATMELANEPOLBAPEX1
SCHEMBL9998760 0.73 ALDH1A1 (0.47) KMT2AATMELANESCN9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH KMT2A 873/4885ATM 4312/4885ELANE 1171/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.