SCHEMBL9998760

SCHEMBL9998760

C=C(C)C(=O)Oc1ccc(OCCC23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
CA9 Q16790 1/20 0.46
KMT2A Q03164 6/20 0.43
ATM Q13315 2/20 0.43
PPARG P37231 1/20 0.43
ELANE P08246 1/20 0.43
POLB P06746 1/20 0.41
APEX1 P27695 1/20 0.41
HTT P42858 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
SCN9A Q15858 1/20 0.41
MEN1 O00255 4/20 0.41
EPHX2 P34913 5/20 0.40
CNR2 P34972 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
MAPT P10636 1/20 0.39
RAB9A P51151 1/20 0.39
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12021005 0.83 KMT2A (0.42) ALDH1A1KMT2AATMELANESCN9A
SCHEMBL7732958 0.82 L3MBTL1 (0.57) ALDH1A1CA9KMT2APPARGPOLB
SCHEMBL7732461 0.79 L3MBTL1 (0.53) ALDH1A1CA9KMT2APPARGPOLB
SCHEMBL11229036 0.78 POLB (0.56) KMT2AATMELANEPOLBAPEX1
SCHEMBL2387597 0.78 PKM (0.53) ALDH1A1KMT2APPARGHTTSCN9A
SCHEMBL5001405 0.77 MEN1 (0.56) ALDH1A1CA9KMT2AATMMEN1
SCHEMBL21900500 0.77 ALDH1A1 (0.46) ALDH1A1CA9KMT2APPARGHTT
SCHEMBL2386670 0.75 PPARG (0.56) ALDH1A1CA9KMT2APPARGTDP1
SCHEMBL19651326 0.75 ELANE (0.53) ALDH1A1KMT2AATMELANEPOLB
SCHEMBL19651323 0.75 ELANE (0.53) ALDH1A1KMT2AATMELANEPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH ALDH1A1 2467/4885CA9 1332/4885KMT2A 873/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.