SCHEMBL9999377

SCHEMBL9999377

C=C(C)C(=O)Oc1cccc(OC(C)(C)C)c1

nearest known ligand 0.46

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.46
CYP3A4 P08684 1/20 0.45
KMT2A Q03164 5/20 0.42
MEN1 O00255 2/20 0.42
LMNA P02545 1/20 0.41
ATM Q13315 1/20 0.40
ACHE P22303 2/20 0.38
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL218655 0.88 ELANE (0.56) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL14173262 0.83 ELANE (0.51) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL26846471 0.83 LMNA (0.59) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL13524175 0.83 CYP3A4 (0.65) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL1437007 0.83 ELANE (0.56) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL31097939 0.81 CYP3A4 (0.68) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL220625 0.81 CYP3A4 (0.68) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL7186457 0.81 CES2 (0.50) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL28992157 0.81 ELANE (0.46) ELANECYP3A4KMT2AMEN1LMNA
SCHEMBL29584051 0.81 ELANE (0.46) ELANECYP3A4KMT2AMEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH ELANE 1171/4885CYP3A4 3608/4885KMT2A 873/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.