Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN4A | P35499 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | IDO1 | P14902 | 1/20 | 0.45 |
| ▸ | NPY5R | Q15761 | 4/20 | 0.43 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | MASP2 | O00187 | 1/20 | 0.42 |
| ▸ | HPGDS | O60760 | 3/20 | 0.39 |
| ▸ | AKT1 | P31749 | 2/20 | 0.38 |
| ▸ | AKT2 | P31751 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17283676 | 0.96 | SCN4A (0.43) | SCN4ACYP3A4IDO1NPY5RSCN2A | |
| SCHEMBL13411815 | 0.87 | POLB (0.33) | SCN4ACYP3A4IDO1POLBALDH1A1 | |
| SCHEMBL3175390 | 0.84 | SCN4A (0.45) | SCN4ACYP3A4IDO1NPY5RSCN2A | |
| SCHEMBL8780980 | 0.83 | METAP2 (0.42) | SCN4ACYP3A4IDO1AKT1AKT2 | |
| SCHEMBL4806159 | 0.79 | PDPK1 (0.50) | IDO1NPY5RAKT1LMNA | |
| SCHEMBL1509473 | 0.79 | CYP2A6 (0.58) | CYP3A4IDO1NPY5RHPGDSLMNA | |
| SCHEMBL15288191 | 0.78 | PLK4 (0.36) | IDO1POLBAKT1AKT2LMNA | |
| SCHEMBL5020178 | 0.77 | ASIC3 (0.48) | CYP3A4RAB9ALMNAALDH1A1 | |
| SCHEMBL1187135 | 0.77 | RPS6KA3 (0.42) | RAB9A | |
| SCHEMBL5020208 | 0.77 | METAP2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 250 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118244583-A | Negative photosensitive polyimide precursor resin composition | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-118240213-A | Negative photosensitive polyimide precursor and composition thereof | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100079-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100734-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-03-05 | — | — | US | disclosed |
| US-20260036904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-02-05 | — | — | US | disclosed |
| US-12504688-B2 | Negative photosensitive resin composition and method for manufacturing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-12-23 | — | — | US | disclosed |
| US-20250370339-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250341778-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-0920966-A2 | A process for devolatilization | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1999-06-09 | — | — | EP | disclosed |
| EP-0650505-B1 | PRODUCTION OF ENCAPSULATED CHEMICAL FOAMING CONCENTRATES | GAIA RES LP (US) | 1998-09-30 | — | — | EP | disclosed |
| US-5621015-A | BLENDING GLYCEROL TRISTEARATE | GAIA RESERCH LIMITED PARTNERSHIP (US) | 1997-04-15 | — | — | US | disclosed |
| US-5611962-A | HIGH MELTING THERMOPLASTIC RESIN CARRIER AND ORGANIC ACID AND BASE FOAMING AGENTS | GAIA RESEARCH (US) | 1997-03-18 | — | — | US | disclosed |
| US-5609892-A | Apparatus for the production of encapsulated foaming concentrates | GAIA RESEARCH (US) | 1997-03-11 | — | — | US | disclosed |
| EP-0705863-A1 | Two stage melt polymerization process for making polybenzimidazoles | HOECHST CELANESE CORPORATION (US) | 1996-04-10 | — | — | EP | disclosed |
| EP-0650505-A1 | PRODUCTION OF ENCAPSULATED CHEMICAL FOAMING CONCENTRATES | GAIA RESEARCH L.P. (US) | 1995-05-03 | — | — | EP | disclosed |
| WO-1993023463-A2 | PRODUCTION OF ENCAPSULATED CHEMICAL FOAMING CONCENTRATES | GAIA RESEARCH L.P. (US) | 1993-11-25 | — | — | WO | disclosed |
| US-5234963-A | Production of encapsulated chemical foaming concentrates | GAIA RESEARCH (US) | 1993-08-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | SCN4A 1461/4885CYP3A4 4650/4885IDO1 2906/4885 |
| US-20260036904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | RER1, ASIC1, FRG1 | SCN4A 1315/4885CYP3A4 3061/4885IDO1 2599/4885 |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ARCN1, PBRM1, LCP1 | SCN4A 3007/4885CYP3A4 4411/4885IDO1 1848/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.