SCHEMBL10027955

SCHEMBL10027955

CCOCOc1ccccc1NC(=O)C(C)CC

nearest known ligand 0.80

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.80
▸ KDM4E B2RXH2 2/20 0.80
▸ L3MBTL1 Q9Y468 1/20 0.80
▸ GAA P10253 3/20 0.50
▸ ALDH1A1 P00352 2/20 0.48
▸ LMNA P02545 2/20 0.48
▸ NPSR1 Q6W5P4 1/20 0.48
▸ POLB P06746 1/20 0.47
▸ MEN1 O00255 2/20 0.46
▸ NPC1 O15118 1/20 0.46
▸ SMN1; SMN2 Q16637 1/20 0.46
▸ CYP2C19 P33261 1/20 0.46
▸ TSHR P16473 1/20 0.45
▸ PKM P14618 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31351354 0.89 KMT2A (1.00) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027968 0.88 KMT2A (0.77) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027979 0.84 KDM4E (0.57) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027973 0.83 KMT2A (0.55) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027972 0.83 KDM4E (0.55) KMT2AKDM4EL3MBTL1ALDH1A1LMNA
SCHEMBL12125175 0.81 KMT2A (0.76) KMT2AKDM4EL3MBTL1ALDH1A1POLB
SCHEMBL10027974 0.81 KMT2A (0.52) KMT2AKDM4EL3MBTL1ALDH1A1MEN1
SCHEMBL10027960 0.78 KDM4E (0.71) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027980 0.78 KMT2A (0.50) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL10027969 0.78 KDM4E (0.70) KMT2AKDM4EL3MBTL1GAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120021357-A1 POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME NEC CORPORATION (JP) 2012-01-26 — — US disclosed
US-7939241-B2 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2011-05-10 — — US disclosed
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2009-03-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method MMAB, DNMT3A, MAT1A KMT2A 185/4885KDM4E 1677/4885L3MBTL1 3368/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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