SCHEMBL10027968

SCHEMBL10027968

CCC(C)C(=O)Nc1ccccc1OCOC

nearest known ligand 0.77

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.77
▸ KDM4E B2RXH2 2/20 0.77
▸ L3MBTL1 Q9Y468 1/20 0.77
▸ TSHR P16473 1/20 0.49
▸ GAA P10253 2/20 0.48
▸ ALDH1A1 P00352 2/20 0.47
▸ LMNA P02545 2/20 0.47
▸ NPSR1 Q6W5P4 1/20 0.46
▸ NPC1 O15118 1/20 0.45
▸ RAB9A P51151 1/20 0.45
▸ POLB P06746 1/20 0.45
▸ MEN1 O00255 2/20 0.45
▸ TP53 P04637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10027955 0.88 KMT2A (0.80) KMT2AKDM4EL3MBTL1TSHRGAA
SCHEMBL31351354 0.87 KMT2A (1.00) KMT2AKDM4EL3MBTL1GAAALDH1A1
SCHEMBL12125175 0.85 KMT2A (0.76) KMT2AKDM4EL3MBTL1TSHRALDH1A1
SCHEMBL10027960 0.80 KDM4E (0.71) KMT2AKDM4EL3MBTL1TSHRGAA
SCHEMBL10027969 0.79 KDM4E (0.70) KMT2AKDM4EL3MBTL1TSHRGAA
SCHEMBL825597 0.77 KMT2A (0.67) KMT2AKDM4EL3MBTL1TSHRALDH1A1
SCHEMBL14026905 0.75 GAA (0.55) KMT2AKDM4ETSHRGAAALDH1A1
SCHEMBL10027970 0.75 LMNA (0.50) KMT2AKDM4EL3MBTL1TSHRGAA
SCHEMBL13596173 0.75 KMT2A (0.78) KMT2AKDM4EL3MBTL1TSHRGAA
SCHEMBL10027966 0.75 KDM4E (0.64) KMT2AKDM4EL3MBTL1TSHRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120021357-A1 POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME NEC CORPORATION (JP) 2012-01-26 — — US disclosed
US-7939241-B2 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2011-05-10 — — US disclosed
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2009-03-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method MMAB, DNMT3A, MAT1A KMT2A 185/4885KDM4E 1677/4885L3MBTL1 3368/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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