SCHEMBL10027966

SCHEMBL10027966

CCC(C)C(=O)Nc1ccccc1OC(=O)OC(C)(C)C

nearest known ligand 0.64

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.64
▸ L3MBTL1 Q9Y468 2/20 0.64
▸ KMT2A Q03164 2/20 0.64
▸ HSD17B10 Q99714 1/20 0.45
▸ TSHR P16473 2/20 0.43
▸ ALDH1A1 P00352 4/20 0.42
▸ LMNA P02545 3/20 0.41
▸ MEN1 O00255 1/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ GAA P10253 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10027969 0.84 KDM4E (0.70) KDM4EL3MBTL1KMT2ATSHRALDH1A1
SCHEMBL12125175 0.79 KMT2A (0.76) KDM4EL3MBTL1KMT2ATSHRALDH1A1
SCHEMBL10027967 0.79 LMNA (0.49) KDM4EL3MBTL1KMT2AHSD17B10ALDH1A1
SCHEMBL825597 0.79 KMT2A (0.67) KDM4EL3MBTL1KMT2AHSD17B10TSHR
SCHEMBL14030959 0.79 RAB9A (0.44) KMT2AHSD17B10ALDH1A1LMNAMEN1
SCHEMBL31351354 0.78 KMT2A (1.00) KDM4EL3MBTL1KMT2AALDH1A1LMNA
SCHEMBL8478426 0.77 HSD17B10 (0.45) KDM4EL3MBTL1KMT2AHSD17B10TSHR
SCHEMBL825495 0.76 KDM4E (0.62) KDM4EL3MBTL1KMT2AHSD17B10TSHR
SCHEMBL1866946 0.75 HSD17B10 (0.45) KDM4EL3MBTL1KMT2AHSD17B10ALDH1A1
SCHEMBL1858242 0.75 MAPK3 (0.46) KMT2AHSD17B10ALDH1A1LMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120021357-A1 POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME NEC CORPORATION (JP) 2012-01-26 — — US disclosed
US-7939241-B2 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2011-05-10 — — US disclosed
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2009-03-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method MMAB, DNMT3A, MAT1A KDM4E 1677/4885L3MBTL1 3368/4885KMT2A 185/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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