Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 3/20 | 0.32 |
| ▸ | CA2 | P00918 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13595415 | 0.84 | ALDH1A1 (0.33) | — | |
| SCHEMBL217339 | 0.84 | THRB (0.42) | EPHX1IDO1CA1CA2 | |
| SCHEMBL13263775 | 0.80 | EPHX1 (0.38) | EPHX1CA1CA2 | |
| SCHEMBL15681507 | 0.80 | EPHX1 (0.43) | EPHX1IDO1CA1CA2 | |
| SCHEMBL20841254 | 0.80 | EPHX1 (0.36) | EPHX1IDO1 | |
| SCHEMBL775568 | 0.78 | TSHR (0.46) | EPHX1IDO1CA1CA2 | |
| SCHEMBL13515123 | 0.78 | — | — | |
| SCHEMBL9946240 | 0.76 | EPHX1 (0.46) | EPHX1IDO1CA1CA2 | |
| SCHEMBL28593098 | 0.76 | EPHX1 (0.42) | EPHX1IDO1CA1CA2 | |
| SCHEMBL20117646 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230161257-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-05-25 | — | — | US | disclosed |
| US-20230104130-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-04-06 | — | — | US | disclosed |
| US-20220214619-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC | 2022-07-07 | — | — | US | disclosed |
| US-10481495-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-19 | — | — | US | disclosed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | EPHX1 3553/4885IDO1 599/4885CA1 2148/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | EPHX1 1968/4885IDO1 1202/4885CA1 3017/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.