Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 3/20 | 0.32 |
| ▸ | CA2 | P00918 | 3/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775568 | 0.91 | TSHR (0.46) | THRBTSHREPHX1ALDH1A1POLB | |
| SCHEMBL15681507 | 0.87 | EPHX1 (0.43) | EPHX1CA1CA2MAPK1SMN1; SMN2 | |
| SCHEMBL10053107 | 0.85 | EPHX1 (0.42) | EPHX1CA1CA2IDO1 | |
| SCHEMBL16866880 | 0.85 | THRB (0.38) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2632780 | 0.85 | CA1 (0.40) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10029328 | 0.84 | EPHX1 (0.38) | EPHX1CA1CA2IDO1 | |
| SCHEMBL10212543 | 0.84 | CA1 (0.46) | THRBTSHRALDH1A1CA1CA2 | |
| SCHEMBL10029326 | 0.83 | TSHR (0.39) | THRBTSHREPHX1ALDH1A1CA1 | |
| SCHEMBL13263775 | 0.83 | EPHX1 (0.38) | EPHX1CA1CA2 | |
| SCHEMBL9946240 | 0.83 | EPHX1 (0.46) | TSHREPHX1ALDH1A1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 609 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100367-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-117452768-A | Composition for immersion photoresist top coating | 徐州博康信息化学品有限公司 | 2024-01-26 | — | — | CN | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | disclosed |
| US-7115771-B2 | Process for producing fluorine-containing alkylsulfonylaminoethyl α-substituted acrylate | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-03 | — | — | US | disclosed |
| US-20050266354-A1 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-12-01 | — | — | US | disclosed |
| US-20050240052-A1 | Process for producing fluorine-containing alkylsulfonylaminoethyl a-substitued acrylate | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-10-27 | — | — | US | disclosed |
| US-6177228-B1 | COMPRISING A RADIATION-SENSITIVE ACID GENERATOR AND A POLYMER COMPRISING THE REACTION PRODUCT OF A MONOMER SELECTED FROM METHACRYLATE OR ACRYLATE HAVING A PHOTOACID CLEAVABLE ESTER SUBSTITUENT AND AN UNSATURATED ESTER MONOMER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-01-23 | — | — | US | disclosed |
| US-6165678-A | Lithographic photoresist composition and process for its use in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-12-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | THRB 3729/4885TSHR 3135/4885EPHX1 3553/4885 |
| US-20050240052-A1 | Process for producing fluorine-containing alkylsulfonylaminoethyl a-substitued acrylate | PFAS, AFF2, AFF1 | THRB 989/4885TSHR 506/4885EPHX1 3679/4885 |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | THRB 4383/4885TSHR 3355/4885EPHX1 4516/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | THRB 2348/4885TSHR 839/4885EPHX1 1998/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.