SCHEMBL1005396

SCHEMBL1005396

[CH2]CCCCCCCCCCOCCOC

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.38
THRB P10828 1/20 0.38
HTT P42858 1/20 0.38
KMT2A Q03164 1/20 0.38
MAPT P10636 1/20 0.38
CA2 P00918 1/20 0.36
EPHX2 P34913 2/20 0.34
ALDH1A1 P00352 1/20 0.33
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28550570 1.00 MEN1 (0.38) MEN1THRBHTTKMT2AMAPT
SCHEMBL11779333 1.00 MEN1 (0.38) MEN1THRBHTTKMT2AMAPT
SCHEMBL14655773 1.00 MEN1 (0.38) MEN1THRBHTTKMT2AMAPT
SCHEMBL28553406 1.00 MEN1 (0.38) MEN1THRBHTTKMT2AMAPT
SCHEMBL7713157 1.00 MEN1 (0.38) MEN1THRBHTTKMT2AMAPT
SCHEMBL11782151 0.97 MEN1 (0.34) MEN1THRBHTTKMT2AMAPT
SCHEMBL2146763 0.92 ALDH1A1 (0.39) MEN1THRBHTTKMT2AMAPT
SCHEMBL95923 0.92 ALDH1A1 (0.39) MEN1THRBHTTKMT2AMAPT
SCHEMBL355712 0.90
SCHEMBL3801559 0.90 CYP3A4 (0.34) MEN1THRBHTTKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2602293-B1 Coating structure and method for forming the same SAMSUNG ELECTRONICS CO LTD (KR) 2018-09-12 EP claimed
US-9249338-B2 Anti-fingerprint coating composition and film using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-02-02 US claimed
EP-2551310-B1 Anti-fingerprint coating composition and film using the same SAMSUNG ELECTRONICS CO LTD (KR) 2015-01-21 EP claimed
US-8883296-B2 Coating structure and method for forming the same SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) 2014-11-11 US claimed
EP-2602293-A1 Coating structure and method for forming the same Samsung Electronics Co., Ltd. (KR) 2013-06-12 EP claimed
US-20130143017-A1 COATING STRUCTURE AND METHOD FOR FORMING THE SAME SAMSUNG ELECTRONICS CO., LTD (KR) 2013-06-06 US claimed
US-20130025503-A1 ANTI-FINGERPRINT COATING COMPOSITION AND FILM USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-01-31 US claimed
WO-2013015600-A2 ANTI-FINGERPRINT COATING COMPOSITION AND FILM USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-01-31 WO claimed
EP-2551310-A1 Anti-fingerprint coating composition and film using the same Samsung Electronics Co., Ltd. (KR) 2013-01-30 EP claimed
US-10809423-B2 Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-10-20 US disclosed
US-10777809-B2 Method for producing negative electrode active material for lithium ion secondary batteries JNC CORPORATION (JP) 2020-09-15 US disclosed
EP-2474577-B1 Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film SAMSUNG ELECTRONICS CO LTD (KR) 2020-08-05 EP disclosed
EP-3442060-B1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORP (JP) 2020-06-03 EP disclosed
US-20190131621-A1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORPORATION (JP) 2019-05-02 US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 EP disclosed
US-20050033077-A1 Production process for silicon compound and the same JNC CORPORATION (JP) 2005-02-10 US disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050033077-A1 Production process for silicon compound and the same STS, SMS, SFXN1 MEN1 1149/4885THRB 1807/4885HTT 2666/4885
US-20130025503-A1 ANTI-FINGERPRINT COATING COMPOSITION AND FILM USING THE SAME PCNA, CNTN1, CUTA MEN1 4198/4885THRB 4636/4885HTT 2348/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.