Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.33 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 4/20 | 0.31 |
| ▸ | MDH1 | P40925 | 1/20 | 0.30 |
| ▸ | MDH2 | P40926 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28762558 | 0.87 | HSD11B1 (0.38) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL11963933 | 0.86 | — | — | |
| SCHEMBL1271393 | 0.84 | CYP19A1 (0.40) | ALDH1A1NPSR1 | |
| SCHEMBL13383446 | 0.81 | PKM (0.37) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL41045 | 0.81 | PKM (0.37) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL14523960 | 0.81 | PKM (0.37) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL15281467 | 0.81 | PKM (0.37) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL17322696 | 0.79 | PKM (0.40) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL3090141 | 0.78 | HSD11B1 (0.36) | PKMALDH1A1HSD11B1DPP8DPP9 | |
| SCHEMBL3686165 | 0.78 | PKM (0.34) | PKMALDH1A1HSD11B1DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8741548-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741548-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507173-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507173-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20100055621-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100055621-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20090226843-A1 | MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090226843-A1 | MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090087786-A1 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087786-A1 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090053651-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090053651-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |