Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.36 |
| ▸ | DPP4 | P27487 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.31 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.31 |
| ▸ | MDH1 | P40925 | 1/20 | 0.31 |
| ▸ | MDH2 | P40926 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ABL1 | P00519 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28762558 | 0.92 | HSD11B1 (0.38) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL1482780 | 0.89 | — | — | |
| SCHEMBL2603060 | 0.79 | HSD11B1 (0.41) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL10064097 | 0.78 | PKM (0.35) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL13383446 | 0.78 | PKM (0.37) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL15281467 | 0.78 | PKM (0.37) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL41045 | 0.78 | PKM (0.37) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL5608375 | 0.77 | PKM (0.39) | HSD11B1DPP4ALDH1A1PKMDPP8 | |
| SCHEMBL283707 | 0.76 | CYP19A1 (0.39) | ALDH1A1NPSR1 | |
| SCHEMBL14523960 | 0.75 | PKM (0.37) | HSD11B1DPP4ALDH1A1PKMDPP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7794914-B2 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-14 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |