SCHEMBL10064132

SCHEMBL10064132

CCC(C)(C)C(=O)Oc1ccc2c(c1)OCO2

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.51
▸ ALOX15 P16050 4/20 0.51
▸ SMN1; SMN2 Q16637 3/20 0.51
▸ LMNA P02545 4/20 0.50
▸ ALDH1A1 P00352 3/20 0.50
▸ GAA P10253 2/20 0.50
▸ TSHR P16473 4/20 0.49
▸ HPGD P15428 3/20 0.49
▸ POLB P06746 2/20 0.48
▸ TP53 P04637 1/20 0.48
▸ KDM4E B2RXH2 2/20 0.46
▸ THRB P10828 1/20 0.46
▸ APEX1 P27695 1/20 0.46
▸ RECQL P46063 1/20 0.46
▸ ATM Q13315 1/20 0.46
▸ HSD17B10 Q99714 1/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ MAPT P10636 4/20 0.45
▸ RAB9A P51151 4/20 0.45
▸ NPC1 O15118 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20408463 0.89 KMT2A (0.40) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL20408465 0.88 GAPDH (0.40) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL28564927 0.81 LMNA (0.51) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL28913508 0.81 MAOB (0.48) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL28567506 0.80 MAOB (0.47) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL1855445 0.80 LMNA (0.62) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL28557968 0.79 MAOB (0.46) KMT2AALOX15SMN1; SMN2LMNAALDH1A1
SCHEMBL29328239 0.79 MAPT (0.57) KMT2ALMNAALDH1A1GAAPOLB
SCHEMBL20408462 0.79 ELANE (0.49) KMT2ASMN1; SMN2LMNAALDH1A1GAA
SCHEMBL1744782 0.79 RAB9A (0.66) KMT2AALOX15SMN1; SMN2LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180210338-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-26 — — US disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 — — US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 — — US disclosed
Send feedback