SCHEMBL10067902

SCHEMBL10067902

O=Cc1cccc2ccc3c(c12)CC=CC3

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 1/20 0.35
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
THRB P10828 1/20 0.34
BLM P54132 1/20 0.34
KMT2A Q03164 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CYP3A4 P08684 2/20 0.34
TSHR P16473 2/20 0.34
ALDH1A1 P00352 2/20 0.32
CYP1A2 P05177 2/20 0.32
HPGD P15428 2/20 0.32
HSD17B10 Q99714 2/20 0.32
CYP1A1 P04798 1/20 0.32
CYP1B1 Q16678 1/20 0.32
ERN1 O75460 2/20 0.32
KDM4E B2RXH2 1/20 0.31
TYMS P04818 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4445413 0.79 CYP2A6 (0.34) CYP2A6MEN1LMNATHRBBLM
SCHEMBL4438638 0.79 CYP2A6 (0.38) CYP2A6MEN1LMNATHRBBLM
SCHEMBL4408085 0.78 LMNA (0.42) CYP2A6MEN1LMNATHRBBLM
SCHEMBL4944634 0.75 THRB (0.52) CYP2A6MEN1LMNATHRBBLM
SCHEMBL4401581 0.75 MEN1 (0.35) CYP2A6MEN1LMNATHRBBLM
SCHEMBL981676 0.73 LMNA (0.55) CYP2A6MEN1LMNATHRBBLM
SCHEMBL4403311 0.70 PPARG (0.39) CYP2A6MEN1LMNAKMT2ATDP1
SCHEMBL10067903 0.70 CYP2A6 (0.36) CYP2A6MEN1LMNATHRBBLM
Pyrene SCHEMBL18343705 0.69 KMT2A (0.65) CYP2A6MEN1LMNATHRBBLM
SCHEMBL10067904 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed