SCHEMBL4401581

SCHEMBL4401581

O=Cc1cccc2c3c(ccc12)CC=CC3

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.35
LMNA P02545 2/20 0.35
KMT2A Q03164 2/20 0.35
THRB P10828 1/20 0.35
BLM P54132 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ERN1 O75460 2/20 0.32
CCR1 P32246 1/20 0.32
CCR5 P51681 1/20 0.32
CCR8 P51685 1/20 0.32
KDM4E B2RXH2 1/20 0.31
PABPC1 P11940 1/20 0.31
HTT P42858 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PTPN1 P18031 1/20 0.31
MAOA P21397 1/20 0.31
MAOB P27338 1/20 0.31
TRIM24 O15164 2/20 0.31
TRIM33 Q9UPN9 2/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408085 0.80 LMNA (0.42) MEN1LMNAKMT2ATHRBBLM
SCHEMBL4403403 0.78 MEN1 (0.34) MEN1LMNAKMT2ATHRBBLM
SCHEMBL4403298 0.78 MEN1 (0.34) MEN1LMNAKMT2ATHRBBLM
SCHEMBL10067902 0.75 CYP2A6 (0.35) MEN1LMNAKMT2ATHRBBLM
SCHEMBL4245330 0.74 MEN1 (0.61) MEN1LMNAKMT2ATHRBBLM
SCHEMBL4408128 0.69 MEN1 (0.32) MEN1LMNAKMT2ATHRBBLM
SCHEMBL4448973 0.68 CYP2A6 (0.42) MEN1KMT2ATDP1KDM4EALDH1A1
SCHEMBL29561529 0.67 MEN1 (0.41) MEN1LMNAKMT2ATHRBBLM
SCHEMBL2860485 0.67 MEN1 (0.41) MEN1LMNAKMT2ATHRBBLM
SCHEMBL6585346 0.66 KMT2A (0.52) MEN1LMNAKMT2ATHRBBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
EP-2447775-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2013-05-29 EP disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed