SCHEMBL10077075

SCHEMBL10077075

CC(C)=CC(c1ccc(OCc2ccccc2)cc1)C(C)(C)C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.50
LMNA P02545 1/20 0.50
CYP1A2 P05177 1/20 0.50
PTGS1 P23219 1/20 0.50
SLC6A2 P23975 1/20 0.50
CYP2C19 P33261 1/20 0.50
PTGS2 P35354 1/20 0.50
SLC6A3 Q01959 1/20 0.50
HIF1A Q16665 1/20 0.50
HDAC6 Q9UBN7 1/20 0.50
PRKCA P17252 1/20 0.49
PRKCD Q05655 1/20 0.49
FFAR1 O14842 2/20 0.48
NPC1 O15118 3/20 0.48
RAB9A P51151 3/20 0.48
CASP3 P42574 1/20 0.48
SENP8 Q96LD8 1/20 0.48
SENP7 Q9BQF6 1/20 0.48
SENP6 Q9GZR1 1/20 0.48
GPR55 Q9Y2T6 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30703580 0.77 MAOB (0.56) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL13588182 0.77 ALDH1A1 (0.43) LMNACYP1A2PTGS1CYP2C19PTGS2
SCHEMBL10077945 0.75 LMNA (0.50) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL27578695 0.74 ALOX5 (0.52) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL13245125 0.74 ALDH1A1 (0.49) FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL1497960 0.73 LMNA (0.61) MAOBLMNACYP1A2PTGS1SLC6A2
Hydrazine SCHEMBL7038883 0.73 ALOX5 (0.49) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL683554 0.73 RXRA (0.66) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL8761083 0.73 LMNA (0.66) MAOBLMNACYP1A2PTGS1SLC6A2
SCHEMBL11606393 0.73 LMNA (0.66) MAOBLMNACYP1A2PTGS1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2362267-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-01-23 EP disclosed
EP-2412733-A1 Polymer, chemically amplified negative resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-02-01 EP disclosed