Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDK2 | P24941 | 1/20 | 0.33 |
| ▸ | CYBB | P04839 | 1/20 | 0.32 |
| ▸ | CDC25B | P30305 | 2/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12999201 | 0.93 | LDHA (0.33) | — | |
| SCHEMBL10077149 | 0.81 | ESR1 (0.45) | CDK2CDC25BESR1ESR2 | |
| SCHEMBL10077941 | 0.76 | MEN1 (0.41) | ESR1ESR2 | |
| SCHEMBL19558277 | 0.74 | KDM4E (0.44) | CDK2CYBBCDC25BESR1ESR2 | |
| SCHEMBL19264731 | 0.71 | CYBB (0.35) | CDK2CYBBCDC25BESR1ESR2 | |
| SCHEMBL15189314 | 0.70 | CDC25B (0.39) | CDK2CYBBCDC25BESR1ESR2 | |
| SCHEMBL8738362 | 0.70 | CDC25B (0.39) | CDK2CYBBCDC25BESR1ESR2 | |
| SCHEMBL10077942 | 0.70 | CYBB (0.34) | CDK2CYBBCDC25BESR1ESR2 | |
| SCHEMBL14577613 | 0.70 | CYBB (0.34) | CDK2CYBBCDC25BEPHX1ESR1 | |
| SCHEMBL19222211 | 0.69 | ESR1 (0.35) | CDK2CYBBCDC25BESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2264525-A2 | Chemically amplified positive photoresist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-22 | — | — | EP | disclosed |