Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCE | Q02156 | 3/20 | 0.44 |
| ▸ | MYLK | Q15746 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | PRKCG | P05129 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | PRKCA | P17252 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.33 |
| ▸ | ERN1 | O75460 | 1/20 | 0.32 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14997925 | 0.93 | PRKCE (0.40) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL26132797 | 0.88 | PRKCE (0.54) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL3063768 | 0.88 | PRKCE (0.54) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL19600596 | 0.87 | PRKCE (0.43) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL10114746 | 0.87 | PRKCE (0.43) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL24088853 | 0.86 | PRKCE (0.52) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL10450418 | 0.85 | PRKCE (0.42) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL16207219 | 0.85 | SHBG (0.46) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL19600590 | 0.85 | PRKCE (0.42) | PRKCEMYLKALDH1A1TDP1MEN1 | |
| SCHEMBL15686504 | 0.85 | SHBG (0.46) | PRKCEMYLKALDH1A1TDP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230350305-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND TREATMENT LIQUID | FUJIFILM CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180052391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD | TORAY INDUSTRIES, INC. (JP) | 2018-02-22 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20170371242-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| US-20170334837-A1 | DIAMINE COMPOUND, AND HEAT-RESISTANT RESIN OR HEAT-RESISTANT RESIN PRECURSOR USING SAME | TORAY INDUSTRIES, INC. (JP) | 2017-11-23 | — | — | US | disclosed |
| US-20170327644-A1 | RESIN AND PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9746772-B2 | Resist underlayer film forming composition for lithography containing polyether structure-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20140224765-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8722841-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8674052-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20130280913-A1 | COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL GROUP-CONTAINING CARBAZOLE NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130189533-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130122710-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-8389649-B2 | Siloxane-based resin composition | TORAY INDUSTRIES, INC. (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20120251949-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120181251-A1 | PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120077345-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170334837-A1 | DIAMINE COMPOUND, AND HEAT-RESISTANT RESIN OR HEAT-RESISTANT RESIN PRECURSOR USING SAME | HEATR1, HSF1, RER1 | PRKCE 3561/4885MYLK 4316/4885ALDH1A1 228/4885 |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | RER1, RAD1, RAD51 | PRKCE 3408/4885MYLK 3497/4885ALDH1A1 1670/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | PRKCE 2659/4885MYLK 3465/4885ALDH1A1 1388/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.