Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | ERN1 | O75460 | 1/20 | 0.45 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.43 |
| ▸ | PDE4A | P27815 | 1/20 | 0.43 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.43 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.43 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | SHBG | P04278 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10130973 | 1.00 | AMY1A (0.47) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL2621002 | 0.93 | ERN1 (0.50) | ERN1PDE4APDE4BPDE4CPDE4D | |
| SCHEMBL16888133 | 0.91 | ERN1 (0.52) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL14159051 | 0.89 | SHBG (0.49) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL1482608 | 0.85 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL29400422 | 0.85 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL210506 | 0.85 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL18998295 | 0.84 | ERN1 (0.46) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL22222032 | 0.81 | AMY1A (0.49) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL187792 | 0.79 | SHBG (0.52) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170285474-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, RESIN PATTERN PRODUCTION METHOD, CURED FILM, AND DISPLAY DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20120077345-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-29 | — | — | US | disclosed |
| EP-1645909-B1 | Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film | SHINETSU CHEMICAL CO (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-7785766-B2 | Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-31 | — | — | US | disclosed |
| US-7485405-B2 | Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7476476-B2 | Photosensitive resin composition, electronic component using the same, and display unit using the same | TORAY INDUSTRIES, INC. (JP) | 2009-01-13 | — | — | US | disclosed |
| US-7455948-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2008-11-25 | — | — | US | disclosed |
| EP-1953183-A2 | Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film | Shin-Etsu Chemical Co., Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20080182087-A1 | SILPHENYLENE-BEARING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE CIRCUIT PROTECTIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20080075999-A1 | Polyelectrolyte Material, Polyelectrolyte Component, Membrane Electrode Composite Body, and Polyelectrolyte Type Fuel Cell | TORAY INDUSTRIES, INC. (JP) | 2008-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | AMY1A 3090/4885CYP2C9 2271/4885CYP2C19 1891/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.