SCHEMBL1013139

SCHEMBL1013139

Sc1nnnn1C1CCCCC1

nearest known ligand 0.53

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.53
ALDH1A1 P00352 7/20 0.50
MAPT P10636 2/20 0.50
TP53 P04637 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.45
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
NPSR1 Q6W5P4 1/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
LMNA P02545 1/20 0.40
NPY1R P25929 1/20 0.40
NPY2R P49146 1/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31399939 0.94 TSHR (0.46) TSHRALDH1A1MAPTTP53L3MBTL1
SCHEMBL2544497 0.79 GAA (0.41) TSHRALDH1A1MAPTTP53MEN1
SCHEMBL20816366 0.75 TSHR (0.53) TSHRALDH1A1MAPTTP53L3MBTL1
SCHEMBL16426472 0.75 TSHR (0.53) TSHRALDH1A1MAPTTP53L3MBTL1
SCHEMBL2549070 0.74 DRD4 (0.40) TSHRALDH1A1MAPTTP53MEN1
SCHEMBL22016316 0.74 MEN1 (0.41) TSHRALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL2548100 0.73 ALDH1A1 (0.42) TSHRALDH1A1MAPTTP53MEN1
SCHEMBL5835202 0.73 TSHR (0.51) TSHRALDH1A1MAPTTP53L3MBTL1
SCHEMBL13997161 0.73 L3MBTL1 (0.59) TSHRALDH1A1MAPTTP53L3MBTL1
SCHEMBL22113418 0.72 TSHR (0.50) TSHRALDH1A1MAPTTP53L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240402603-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING LAYERED BODY RESONAC CORPORATION (JP) 2024-12-05 US disclosed
CN-117980821-A Photosensitive resin composition, photosensitive element, and method for producing laminate 株式会社力森诺科 2024-05-03 CN disclosed
WO-2023190719-A1 RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, TRANSPARENT ANTENNA AND IMAGE DISPLAY DEVICE 株式会社レゾナック 2023-10-05 WO disclosed
WO-2023058600-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING LAYERED BODY 株式会社レゾナック 2023-04-13 WO disclosed
CN-108934126-B Etching solution, replenishment solution, and method for forming copper wiring MEC股份有限公司 2021-12-28 CN disclosed
EP-3438166-B1 RESIN COMPOSITE FILM INCLUDING CELLULOSE MICROFIBER LAYER ASAHI CHEMICAL IND (JP) 2021-12-15 EP disclosed
EP-3199701-B1 THIN-FILM SHEET INCLUDING CELLULOSE FINE-FIBER LAYER ASAHI CHEMICAL IND (JP) 2021-10-27 EP disclosed
CN-113179590-A Etching solution, replenishment solution, and method for forming copper wiring MEC股份有限公司 2021-07-27 CN disclosed
CN-112867812-A Etching liquid composition and etching method 株式会社ADEKA 2021-05-28 CN disclosed
CN-108884251-B Resin composite film comprising cellulose microfiber layer 旭化成株式会社 2021-04-27 CN disclosed
US-4737442-A INCLUDING A SENSITIZER AND A BLOCKED DEVELOPMENT RESTRAINER; FREE OF BLACK SPOTS FUJI PHOTO FILM CO., LTD. (JP) 1988-04-12 US disclosed
EP-0087176-B1 METHOD FOR THE PREPARATION OF A PLANOGRAPHIC PRINTING PLATE AGFA-GEVAERT N.V. (BE) 1987-07-01 EP disclosed
US-4663323-A Tetrazole derivatives, anti-ulcer composition containing the same and method for treating ulcers OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1987-05-05 US disclosed
US-4563410-A NICKEL SULFIDE; HYDROPHOBIZING SILVER IMAGE AGFA-GEVAERT N.V. (BE) 1986-01-07 US disclosed
EP-0035046-B1 NOVEL TETRAZOLE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF, AND ANTI-ULCER COMPOSITION CONTAINING THE SAME OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1985-10-02 EP disclosed
US-4540703-A Tetrazole derivatives, anti-ulcer composition containing the same and method for treating ulcers OTSUKA PHARMACEUTICAL COMPANY, LIMITED (JP) 1985-09-10 US disclosed
US-4414308-A Silver halide color photographic photosensitive material KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1983-11-08 US disclosed
EP-0087176-A1 Method for the preparation of a planographic printing plate AGFA-GEVAERT N.V. (BE) 1983-08-31 EP disclosed
EP-0035046-A1 Novel tetrazole derivatives, process for the preparation thereof, and anti-ulcer composition containing the same OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1981-09-09 EP disclosed
US-4110338-A Product and preparation of 1H-tetrazole-5-thiol derivatives FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1978-08-29 US disclosed