Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.43 |
| ▸ | CKS1B | P61024 | 1/20 | 0.43 |
| ▸ | SKP1 | P63208 | 1/20 | 0.43 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | SCN1A | P35498 | 1/20 | 0.38 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.38 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685883 | 0.88 | ALDH1A1 (0.56) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL16772260 | 0.85 | ALDH1A1 (0.48) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL17344411 | 0.80 | TDP1 (0.47) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL4373737 | 0.80 | NPSR1 (0.48) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL4362824 | 0.77 | ALDH1A1 (0.43) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL24212719 | 0.76 | MEN1 (0.45) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL12500713 | 0.76 | KMT2A (0.45) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL12093413 | 0.75 | NAAA (0.38) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL6368046 | 0.74 | POLB (0.54) | ALDH1A1KMT2AMEN1HTTNPSR1 | |
| SCHEMBL111835 | 0.74 | MEN1 (0.45) | ALDH1A1KMT2AMEN1HTTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8236842-B2 | Salt and process for producing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-07 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110201823-A1 | SALT AND PROCESS FOR PRODUCING ACID GENERATOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110200935-A1 | PHOTORESIST COMPOSITION | C1R, F12, C1S | ALDH1A1 2022/4885KMT2A 2752/4885MEN1 2992/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | ALDH1A1 2064/4885KMT2A 869/4885MEN1 1501/4885 |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | H1-0, H1-2, H1-3 | ALDH1A1 1807/4885KMT2A 599/4885MEN1 2450/4885 |
| US-20110201823-A1 | SALT AND PROCESS FOR PRODUCING ACID GENERATOR | FGFR1, MTX1, RER1 | ALDH1A1 2214/4885KMT2A 1055/4885MEN1 14/4885 |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, AFF1, FRG1 | ALDH1A1 2966/4885KMT2A 1523/4885MEN1 536/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.