SCHEMBL10178459

SCHEMBL10178459

CCC(C)c1ccc(COC2=CC(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 3/20 0.48
IDO1 P14902 2/20 0.48
CDC25A P30304 2/20 0.48
PTPRC P08575 2/20 0.44
GAPDH P04406 1/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
NSD2 O96028 1/20 0.40
S100A4 P26447 2/20 0.39
MAOA P21397 2/20 0.38
MAOB P27338 2/20 0.38
SOAT1 P35610 2/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
PTPN1 P18031 2/20 0.38
ALDH1A1 P00352 2/20 0.37
PLIN1 O60240 1/20 0.37
NR1I2 O75469 1/20 0.37
USP2 O75604 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178550 0.87 CDC25B (0.46) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL8460927 0.81 GAPDH (0.57) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL13144212 0.77 S100A4 (0.68) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL29800450 0.75 CDC25B (0.74) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL2511730 0.75 CDC25B (0.74) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL9628358 0.72 CDC25B (0.61) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL6722051 0.72 BCHE (0.56) L3MBTL1NPC1RAB9AALDH1A1HSP90AA1
SCHEMBL9713967 0.72 CDC25B (0.61) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL10178454 0.71 RXRA (0.56) MEN1KMT2AL3MBTL1MAOAMAOB
SCHEMBL10178591 0.71 NPC1 (0.40) L3MBTL1NPC1RAB9AALDH1A1HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed