SCHEMBL10178550

SCHEMBL10178550

CCC(C)c1cccc(COC2=CC(=O)c3ccccc3C2=O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 3/20 0.46
IDO1 P14902 2/20 0.46
CDC25A P30304 2/20 0.46
PTPRC P08575 2/20 0.43
HDAC4 P56524 1/20 0.42
HDAC2 Q92769 1/20 0.42
HDAC8 Q9BY41 1/20 0.42
GAPDH P04406 1/20 0.40
S100A4 P26447 2/20 0.37
MAOA P21397 2/20 0.37
MAOB P27338 2/20 0.37
SOAT1 P35610 2/20 0.37
PTPN1 P18031 3/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
NSD2 O96028 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
PLIN1 O60240 1/20 0.36
NR1I2 O75469 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178459 0.87 CDC25B (0.48) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL8460927 0.79 GAPDH (0.57) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL10178653 0.76 BCHE (0.53) MAOBMEN1KMT2ASMN1; SMN2BCHE
SCHEMBL10179168 0.75 BCHE (0.40) HDAC4HDAC2HDAC8GAABCHE
SCHEMBL10179112 0.74 PTGER1 (0.50) L3MBTL1USP2LMNAMAPTPKM
SCHEMBL2511730 0.73 CDC25B (0.74) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL29800450 0.73 CDC25B (0.74) CDC25BIDO1CDC25APTPRCGAPDH
SCHEMBL10178628 0.72 TSHR (0.50) HDAC4HDAC2HDAC8BCHE
SCHEMBL10178568 0.72 HDAC4 (0.47) IDO1HDAC4HDAC2HDAC8USP2
SCHEMBL10178751 0.71 FFAR1 (0.53) MAOBBCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed