SCHEMBL10178491

SCHEMBL10178491

CCCCCCSCc1ccc(C(C)CC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 1/20 0.39
CYSLTR2 Q9NS75 1/20 0.37
CYSLTR1 Q9Y271 1/20 0.37
ALDH1A1 P00352 2/20 0.36
USP2 O75604 1/20 0.36
GAA P10253 1/20 0.36
PKM P14618 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36
LMNA P02545 2/20 0.33
CYP2C9 P11712 1/20 0.33
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
TSHR P16473 1/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
ALOX12 P18054 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27348755 0.86 ALDH1A1 (0.35) ALDH1A1USP2GAAPKMHPGD
SCHEMBL29388293 0.84 ESR1 (0.42) HTR2AALDH1A1HSD17B10LMNACYP2C9
SCHEMBL6075249 0.84 ESR1 (0.42) HTR2AALDH1A1HSD17B10LMNACYP2C9
SCHEMBL8999593 0.82 TYR (0.41) HTR2AALDH1A1HSD17B10LMNACYP2C9
SCHEMBL14607239 0.80 ALDH1A1 (0.41) ALDH1A1USP2GAAPKMHPGD
SCHEMBL10178487 0.79 ALDH1A1 (0.42) ALDH1A1USP2GAAPKMHPGD
SCHEMBL24021959 0.78 HTR2A (0.56) HTR2ACYSLTR2CYSLTR1ALDH1A1HSD17B10
SCHEMBL28827751 0.78 HTR2A (0.56) HTR2ACYSLTR2CYSLTR1ALDH1A1HSD17B10
SCHEMBL9020980 0.77 MAOA (0.58) MAOAMAOB
SCHEMBL8019398 0.76 LMNA (0.42) ALDH1A1GAALMNACYP2C9MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4394506-A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME Samsung Electronics Co., Ltd. (KR) 2024-07-03 EP disclosed
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed