SCHEMBL10178524

SCHEMBL10178524

CCC(C)c1ccc(CC(=O)N2C(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ABCB1 P08183 4/20 0.40
▸ LMNA P02545 1/20 0.39
▸ ALDH1A1 P00352 2/20 0.39
▸ HPGD P15428 1/20 0.39
▸ PPARG P37231 1/20 0.39
▸ PPARD Q03181 1/20 0.39
▸ PPARA Q07869 1/20 0.39
▸ CASP3 P42574 1/20 0.39
▸ CASP7 P55210 1/20 0.39
▸ NPC1 O15118 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ MEN1 O00255 2/20 0.38
▸ KMT2A Q03164 2/20 0.38
▸ CES1 P23141 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ ASAH1 Q13510 1/20 0.38
▸ HRH3 Q9Y5N1 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178531 0.86 PPARA (0.43) ABCB1LMNAALDH1A1PPARGPPARD
SCHEMBL10180117 0.85 HDAC4 (0.46) LMNAALDH1A1CASP3CASP7RAB9A
SCHEMBL13144182 0.80 LMNA (0.44) ABCB1LMNAALDH1A1NPC1RAB9A
SCHEMBL11714079 0.78 KMT2A (0.57) ALDH1A1CASP3CASP7MEN1KMT2A
SCHEMBL6722008 0.77 CASP3 (0.57) ABCB1ALDH1A1HPGDCASP3KDM4E
SCHEMBL10178728 0.76 HDAC4 (0.44) ALDH1A1CASP3CASP7KMT2ACES1
SCHEMBL10180072 0.75 PTGS2 (0.45) LMNAALDH1A1HPGDNPC1RAB9A
SCHEMBL10178704 0.75 PTGS2 (0.54) ALDH1A1CASP3CASP7NPC1RAB9A
SCHEMBL10001830 0.74 TSHR (0.49) ALDH1A1NPC1RAB9AKDM4EKMT2A
SCHEMBL19542301 0.72 SMN1; SMN2 (0.53) ALDH1A1HPGDNPC1KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 — — US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 — — US disclosed
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