Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 3/20 | 0.42 |
| ▸ | HTR7 | P34969 | 7/20 | 0.41 |
| ▸ | RAD52 | P43351 | 1/20 | 0.40 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178704 | 0.93 | PTGS2 (0.54) | PTGS2POLBHTR7P2RX4KDM4E | |
| SCHEMBL10178700 | 0.86 | HTR7 (0.45) | PTGS2POLBHTR7LMNAALDH1A1 | |
| SCHEMBL10178546 | 0.85 | HDAC4 (0.43) | PTGS2POLBHTR7RAD52P2RX4 | |
| SCHEMBL10180106 | 0.81 | PTGS2 (0.52) | PTGS2HTR7P2RX4LMNAALDH1A1 | |
| SCHEMBL13144176 | 0.80 | LMNA (0.60) | PTGS2POLBP2RX4LMNAHTT | |
| SCHEMBL12732178 | 0.78 | HTR7 (0.52) | POLBHTR7RAD52KDM4ELMNA | |
| SCHEMBL10178699 | 0.76 | HTR7 (0.44) | HTR7 | |
| SCHEMBL10178524 | 0.75 | ABCB1 (0.40) | KDM4ELMNAALDH1A1HPGDNPC1 | |
| SCHEMBL6721982 | 0.75 | CYP19A1 (0.58) | P2RX4HDAC6 | |
| SCHEMBL12012946 | 0.74 | RXFP1 (0.52) | KDM4EALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |